1997
DOI: 10.1063/1.366349
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Relaxation mechanisms in single InxGa1−xAs epilayers grown on misoriented GaAs(111¯)B substrates

Abstract: Articles you may be interested inEffect of indium surfactant on stress relaxation by V-defect formation in GaN epilayers grown by metalorganic chemical vapor deposition

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Cited by 16 publications
(4 citation statements)
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“…Evidence of the role of temperature in the elastic limit reduction and in the nucleation of dislocation half-loops from surface steps is obtained. Steps in real crystals are rarely straight, and it has been proposed that a notch or kinked-step would initiate the nucleation of a dislocation half-loop [20,21]. This is investigated here by comparing the plastic events obtained from either straight and non-straight steps.…”
mentioning
confidence: 99%
“…Evidence of the role of temperature in the elastic limit reduction and in the nucleation of dislocation half-loops from surface steps is obtained. Steps in real crystals are rarely straight, and it has been proposed that a notch or kinked-step would initiate the nucleation of a dislocation half-loop [20,21]. This is investigated here by comparing the plastic events obtained from either straight and non-straight steps.…”
mentioning
confidence: 99%
“…In the case of -1° offcut the experimental critical thickness t c seemed smaller than for the nominal (111) orientation. (ii) For 2° off-cut [23], 60° misfit dislocations were observed in the three {111} planes inclined to the surface for film thicknesses around t c . However the dislocation density was found higher in the ) 11 1 ( plane.…”
Section: Generation At the Interface Or Within The Filmmentioning
confidence: 98%
“…ii. For 2° off-cut [21] around t c , 60° MDs were observed in the three {111} planes inclined to the surface. However the dislocation density was found higher in the planes, the major defects are nano-twins in the same planes (Fig.…”
Section: Figurementioning
confidence: 99%