. Effect of high current density on the admittance response of interface states in ultrathin MIS tunnel junctions.. Solid-State Electronics, Elsevier, 2013, 80, pp.142-151 electronic mail: christian.godet@univ-rennes1.fr ********************************************************************************* and from the low-high frequency capacitance method valid for thick MIS devices; the low defect density near mid-gap ( < 10 11 eV -1 .cm -2 ) results from a good passivation of dangling bonds at the C 12 H 25 -n Si interface. In the high current density regime ( > 1 mA.cm -2 ), the admittance depends strongly on both the density of localized states and the dc current density, so that the excess capacitance method overestimates. For very high current densities (J > 10 mA.cm -2 ), the observation of a linear C(ω ≈ 0) vs (J) dependence could indicate some Fermi level pinning in a high interface density of states located near the Si conduction band. The temperature-independent excess capacitance C(ω ≈ 0) -C(1 MHz) observed at very small J, not predicted by the admittance model, is attributed to some dipolar relaxation in the molecular junction.3