Large area film deposition was performed by means of multitarget reactive magnetron sputtering from metallic targets (Pb, Ti, Zr) with a diameter of 200 mm onto Cu-coated Kapton® HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.