Region-Based Pattern Generation Scheme for DMD Based Maskless Lithography

Seo, Manseung; Song, Jae–Sung; An, Changgeun

doi:10.1007/11767978_10

Cited by 1 publication

(3 citation statements)

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“…Nowadays, many new application fields for them have emerged. One of them is maskless lithography for semiconductor and Flat Panel Display (FPD) fabrication [3][4][5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

“…It is characterized by sufficient throughput for highly customized patterns, fine lithographic quality, efficiency in cost and time [9], and so on. Nevertheless, the micromirror based lithography is feasible if, and only if, each system developer could set up an excellent optic unit [10,11], and an accurate DMD control unit [3][4][5][6][7][8]12]. To fabricate lithographic patterns, millions of micromirrors on the DMD need to be addressed and adjusted, individually and instantaneously.…”

Section: Introductionmentioning

confidence: 99%

“…However, detailed discussion on the DMD control is beyond the scope of this paper. The details on the DMD control associated with the proposed system can be found in the literature [8,12].…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

Lee¹

2010

Journal of the Optical Society of Korea

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In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 µm resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 µm line width.

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“…Nowadays, many new application fields for them have emerged. One of them is maskless lithography for semiconductor and Flat Panel Display (FPD) fabrication [3][4][5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%