“…With the development of microfabrication technology, subwavelength structures can be directly fabricated on the surface of optoelectronic devices using microelectronic process technology, thereby improving the damage threshold of anti-reflection layers and greatly enhancing the stability of anti-reflection functional coatings [2] . The diverse functionality and design flexibility of subwavelength structures have led to their increasing use in defense, laser processing, aerospace, and other fields [3][4][5] .…”
Subwavelength structured gratings are increasingly used in new optoelectronic devices, micro-optical electromechanical systems, and other fields due to their functional diversity and large design freedom. When the characteristic size of the structure is much smaller than the wavelength of the incident light, only zero-order reflection and transmission diffraction will exist. By changing the parameter values of column width, duty cycle, and trench depth of the subwavelength structured grating, its reflectivity can be changed. In this paper, the finite difference time domain method (FDTD) and the equivalent medium theory are used to study and analyze the influence of the subwavelength structural parameters of the grating on the reflection characteristics and design an anti-reflection subwavelength structural grating with an operating wavelength of 1064nm. The simulation results show that when the grating period is 0.4μm, the duty cycle is 0.875, the groove depth is 0.23μm, and the column width is 0.35μm, the reflectivity of the subwavelength structure grating for incident light from 0° to 30° can reach 0.5%~0.7%.
“…With the development of microfabrication technology, subwavelength structures can be directly fabricated on the surface of optoelectronic devices using microelectronic process technology, thereby improving the damage threshold of anti-reflection layers and greatly enhancing the stability of anti-reflection functional coatings [2] . The diverse functionality and design flexibility of subwavelength structures have led to their increasing use in defense, laser processing, aerospace, and other fields [3][4][5] .…”
Subwavelength structured gratings are increasingly used in new optoelectronic devices, micro-optical electromechanical systems, and other fields due to their functional diversity and large design freedom. When the characteristic size of the structure is much smaller than the wavelength of the incident light, only zero-order reflection and transmission diffraction will exist. By changing the parameter values of column width, duty cycle, and trench depth of the subwavelength structured grating, its reflectivity can be changed. In this paper, the finite difference time domain method (FDTD) and the equivalent medium theory are used to study and analyze the influence of the subwavelength structural parameters of the grating on the reflection characteristics and design an anti-reflection subwavelength structural grating with an operating wavelength of 1064nm. The simulation results show that when the grating period is 0.4μm, the duty cycle is 0.875, the groove depth is 0.23μm, and the column width is 0.35μm, the reflectivity of the subwavelength structure grating for incident light from 0° to 30° can reach 0.5%~0.7%.
Crystalline silicon thin-film solar cells with period-mismatched sine dual-interface gratings are proposed. Several structural parameters of the front and rear gratings, such as heights, periods, and duty ratios, are optimized using the finite-difference time-domain method. The mechanisms of absorption enhancement are also illustrated by analyzing the optical and electrical performance in thin-film solar cells with different grating arrangements. Numerical results indicate that the period-mismatched sine dual-interface grating structure shows obvious improvement in absorption efficiency and is more suitable for grating structures with small period. The short-circuit current density of the period-mismatched dual-interface sine grating structure is improved to
18.89
m
A
/
c
m
2
, an increase of 41.39% as compared with the planar structure. The research findings can be utilized to guide the design of grating structures for thin-film solar cells.
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