2018
DOI: 10.1038/s41598-018-28992-9
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Reduction of the forming voltage through tailored oxygen non-stoichiometry in tantalum oxide ReRAM devices

Abstract: In this study, we investigated the influence of oxygen non-stoichiometry on the resistive switching performance of tantalum oxide based memristive devices. Thin-films of tantalum oxide were deposited with varying sputter power and oxygen partial pressure. The electroforming voltage was found to decrease with increasing power density or decreased oxygen partial pressure, while the endurance remained stable and the resistance window ROFF/RON was found to increase. In-depth XPS analysis connects these observation… Show more

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Cited by 45 publications
(32 citation statements)
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References 42 publications
(36 reference statements)
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“…The XPS survey spectra of representative CoF‐2 and CoF‐3 samples reveal the O/Co ratios to be 2.28 and 2.48, respectively, which correspond to 43 and 38 % O defects, respectively. Our method of O defect estimation is different from that employed by Skaja et al., in which oxygen nonstoichiometry was induced by Ar/O 2 flow rates and binding energy shifts were monitored to estimate the oxygen deficiency . The Rietveld refinement and XPS data are duly corroborated by Raman spectroscopy analysis, which shows a shift of the E g mode to longer wavenumbers for CoF‐2 and CoF‐3, indicating predominant lattice distortion in these two catalysts.…”
Section: Resultsmentioning
confidence: 86%
“…The XPS survey spectra of representative CoF‐2 and CoF‐3 samples reveal the O/Co ratios to be 2.28 and 2.48, respectively, which correspond to 43 and 38 % O defects, respectively. Our method of O defect estimation is different from that employed by Skaja et al., in which oxygen nonstoichiometry was induced by Ar/O 2 flow rates and binding energy shifts were monitored to estimate the oxygen deficiency . The Rietveld refinement and XPS data are duly corroborated by Raman spectroscopy analysis, which shows a shift of the E g mode to longer wavenumbers for CoF‐2 and CoF‐3, indicating predominant lattice distortion in these two catalysts.…”
Section: Resultsmentioning
confidence: 86%
“…To determine the variation of oxygen vacancy content, an XPS analysis was carried out. [29], respectively. By increasing the P O2 , the portion of oxygen vacancy was gradually decreased.…”
Section: Methodsmentioning
confidence: 97%
“…deconvoluted to two main peaks centred at around ~530 eV and 531.0~531.5 eV. The peaks at ~530 eV and 531.0-531.5 eV represent the oxygen species in metal-oxygen-metal (M-O-M) and near the oxygen vacancy (O-M-Ovac) [29], respectively. By increasing the PO2, the portion of oxygen vacancy was gradually decreased.…”
Section: Methodsmentioning
confidence: 99%
“…[ 1 , 2 , 3 , 4 ]. So far, RRAM has been reported in a variety of material systems, including organic materials [ 5 ], complex composition materials [ 6 ], and binary transition metal oxide materials [ 7 , 8 ]. In addition, compared with the other material systems, various new types of metal-oxide based RRAM devices are being devised, attributable to their potential advantages [ 9 , 10 ], as well as excellent compatibility with the current complementary metal oxide semiconductor (CMOS) technology [ 11 ].…”
Section: Introductionmentioning
confidence: 99%