1999
DOI: 10.1134/1.1131099
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Reduction of elastic strains in directly-bonded silicon structures

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Cited by 5 publications
(1 citation statement)
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“…In the X-ray topographs of the SOI layer of the bonded SOI wafers, wrinkled patterns have been observed, which were interpreted due to the lattice undulation existing in the SOI layers. [4][5][6][7][8][9] Matsui et al showed using a synchrotron X-ray microbeam technique that the lattice planes of the bonded SOI layer were locally inclined without any change in lattice spacing, the inclination angle reached more than 16 arcsec and the spatial interval of the undulation ranged from 10 to 100 mm. 10) Recently, we have carried out a systematic research for the lattice undulation of bonded SOI wafers by monochromatic X-ray topography using a synchrotron radiation source [11][12][13][14] and showed the existence of a similar lattice undulation of the SOI layer even in the state-of-the-art commercial bonded SOIs manufactured by the hydrogendelamination-induced splitting and the epitaxial-layer-transfer processes.…”
Section: Introductionmentioning
confidence: 99%
“…In the X-ray topographs of the SOI layer of the bonded SOI wafers, wrinkled patterns have been observed, which were interpreted due to the lattice undulation existing in the SOI layers. [4][5][6][7][8][9] Matsui et al showed using a synchrotron X-ray microbeam technique that the lattice planes of the bonded SOI layer were locally inclined without any change in lattice spacing, the inclination angle reached more than 16 arcsec and the spatial interval of the undulation ranged from 10 to 100 mm. 10) Recently, we have carried out a systematic research for the lattice undulation of bonded SOI wafers by monochromatic X-ray topography using a synchrotron radiation source [11][12][13][14] and showed the existence of a similar lattice undulation of the SOI layer even in the state-of-the-art commercial bonded SOIs manufactured by the hydrogendelamination-induced splitting and the epitaxial-layer-transfer processes.…”
Section: Introductionmentioning
confidence: 99%