Reduction kinetics of thin and thick cupric oxide films at room temperature by hydrazine

An in situ temperature‐programmed XPS study of the surface chemical reactions of thiophene with Ag/titania

“…The other approach is to furnish the XPS apparatus with an in situ reagent dosage and employ the differentially pumped system ('high-pressure XPS'). High-pressure XPS was used, for instance, to study reduction of cupric oxide films by hydrazine [29] ; however, its design requires either the high capital investments or significant engineering efforts. Yet another approach is to furnish the XPS specimen holder with in situ linear heating, thermocouple and the leak valve for the gaseous reactant of interest, thus converting the standard XPS chamber into an in situ chemical reactor and a spectrometer.…”

Study of the Surface Chemical Reactions of Thiophene with Ag/Titania by the Complementary Temperature-Programmed Electron Spin Resonance, Temperature-Programmed Desorption, and X-ray Photoelectron Spectroscopy: Adsorption, Desorption, and Sorbent Regeneration Mechanisms

“…XPS was used to study, for instance, the adsorption complex formed upon adsorption of dibenzothiophene (DBT) onto the Ag+/SBA-15 sorbent under ambient conditions, the adsorption sites and surface phases formed on ruthenium catalysts following H 2 S pretreatment in the ex situ reactor, and decomposition of the sulfates formed as the intermediates during thermal oxidative regeneration of the “spent” H 2 S sorbents based on the transition-metal oxides . The alternative way of using XPS is furnishing the standard XPS apparatus with an in situ reagent dosage accessory and with a differentially pumped vacuum system (“high-pressure XPS”) . The high-pressure XPS was used for studies of reduction of cupric oxide films by hydrazine vapors at 80−1462 Pa and 273−373 K .…”

“…The alternative way of using XPS is furnishing the standard XPS apparatus with an in situ reagent dosage accessory and with a differentially pumped vacuum system (“high-pressure XPS”) . The high-pressure XPS was used for studies of reduction of cupric oxide films by hydrazine vapors at 80−1462 Pa and 273−373 K . This approach requires high capital investments or significant engineering efforts.…”

“…30 The alternative way of using XPS is furnishing the standard XPS apparatus with an in situ reagent dosage accessory and with a differentially pumped vacuum system ("high-pressure XPS"). 31 The high-pressure XPS was used for studies of reduction of cupric oxide films by hydrazine vapors at 80-1462 Pa and 273-373 K. 31 This approach requires high capital investments or significant engineering efforts. Another powerful capability of XPS that should be useful for the studies of surface chemical reactions is to furnish the sample holder with in situ linear heating, temperature measurements, and a reactant dosage system.…”

Note: Heated sample platform for in situ temperature-programmed XPS

“…The "standard" XPS instruments cannot operate at pressures above ∼10 −4 Torr; however, the "hybrid" XPS systems can be built of: (i) an ex situ chemical, adsorption or catalytic reactor and (ii) the HV/UHV chamber with XPS spectrometer. 2 Alternatively, the "standard" XPS apparatus is equipped with an in situ reagent dosage accessory 3 and/or an in situ sample heater. If the temperature of the XPS sample is varied linearly in time, the technique is Temperature-Programmed XPS, TPXPS.…”