1990
DOI: 10.1016/0257-8972(90)90084-p
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Reduction in macroparticles during the deposition of TiN films prepared by arc ion plating

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Cited by 69 publications
(5 citation statements)
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“…As is known, the formation of microdroplets and their penetration into the structures of modifying coatings are a significant problem, typical of the physical vapour deposition (PVD) method [1][2][3][4][5]. Technologies and equipment-from simple arrays to complex magnetic traps-are being actively developed and used to significantly reduce the number of microdroplets [6][7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…As is known, the formation of microdroplets and their penetration into the structures of modifying coatings are a significant problem, typical of the physical vapour deposition (PVD) method [1][2][3][4][5]. Technologies and equipment-from simple arrays to complex magnetic traps-are being actively developed and used to significantly reduce the number of microdroplets [6][7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…This fraction depends on the conditions, and in particular on the geometry of the path from the arc to the substrates, and the orientation and strength of the magnetic fields used to control cathode spot motion or collimate the plasma. In some systems the plasma is magnetically guided through a duct to reduce macroparticle contamination [3].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the arc was excited under low pressure or under vacuum as described in [2,4]. The power of arc discharge is concentrated directly in the crater of cathode arc spot, and it reaches about 109 V/cm 2 .…”
Section: Introductionmentioning
confidence: 99%
“…Leading manufacturers of coated cutting tools apply several fundamentally different processes for coating deposition, and each of them has its own advantages and disadvantages [1,[2][3][4][5][6][8][9][10]. The processes of physical vapor deposition (arc PVD) are increasingly used in manufacturing of cutting tools.…”
Section: Introductionmentioning
confidence: 99%
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