Reducing the line curvature error of mechanically ruled gratings by interferometric control

Yu, Haili; Li, Xiaotian; Zhu, Jie; Yu, Hongzhu; Qi, Xiangdong; Feng, Shulong

doi:10.1007/s00340-014-5832-z

Cited by 17 publications

(2 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…To improve the accuracy of the linear scale, several processing methods have evolved, such as mechanical ruling [ 1 ], ion-beam etching [ 2 ], nanoimprinting lithography, and UV optical lithography. However, mechanical ruling and ion-beam etching primarily produce plane diffraction gratings, which require deep grooves with strict shapes that can produce non-ideal curved gratings [ 3 ]. The roller subdivision and 2PI errors offer challenges to nanoimprinting lithography for high-precision grating; a special rotating exposure to roller mold fabrication was analyzed to fabricate gratings in a large area [ 4 ].…”

Section: Introductionmentioning

confidence: 99%

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

Ren

Zhao

Zhang

et al. 2016

Sensors

View full text Add to dashboard Cite

A multi-repeated photolithography method for manufacturing an incremental linear scale using projection lithography is presented. The method is based on the average homogenization effect that periodically superposes the light intensity of different locations of pitches in the mask to make a consistent energy distribution at a specific wavelength, from which the accuracy of a linear scale can be improved precisely using the average pitch with different step distances. The method’s theoretical error is within 0.01 µm for a periodic mask with a 2-µm sine-wave error. The intensity error models in the focal plane include the rectangular grating error on the mask, static positioning error, and lithography lens focal plane alignment error, which affect pitch uniformity less than in the common linear scale projection lithography splicing process. It was analyzed and confirmed that increasing the repeat exposure number of a single stripe could improve accuracy, as could adjusting the exposure spacing to achieve a set proportion of black and white stripes. According to the experimental results, the effectiveness of the multi-repeated photolithography method is confirmed to easily realize a pitch accuracy of 43 nm in any 10 locations of 1 m, and the whole length accuracy of the linear scale is less than 1 µm/m.

show abstract

Section: Introductionmentioning

confidence: 99%

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

Ren

Zhao

Zhang

et al. 2016

Sensors

View full text Add to dashboard Cite

show abstract

“…4,5 And there is an urgent demand for largearea echelle gratings with excellent properties in fields such as the military, aerospace, astronomy and biochemical analysis. [6][7][8] To achieve high-performance and largesize echelle gratings, one of the key factors is to prepare a thick, flat, homogeneous and large-area Al coating on the glass blank, meanwhile the grooves should be made on Al coating surface. 9 For almost all of the deposition techniques, such as electron beam evaporation and sputtering, the deposition angle significantly affects the quality of deposited films.…”

Section: Introductionmentioning

confidence: 99%

Structural property investigation on obliquely deposited thick Al films

Gao

Yang

et al. 2016

Surface Engineering

View full text Add to dashboard Cite

As we know, high-quality large-area thick Al films have important applications in echelle gratings. To fabricate them, the deposition angle is one of the most decisive factors. In this study, for the first time we investigate the structural properties of thick Al films deposited by electron beam evaporation at different deposition angles. By measuring film morphology, surface roughness and hardness, we demonstrate the influences of deposition angle on structural properties of thick Al films. A large amount of columnar microstructures and air voids appear in thick Al films with deposition angle increasing, which seriously degrade surface roughness and film hardness. The formation origin of columnar microstructures and air voids is clarified through growth dynamics analysis of Al films. The large deposition angle could significantly reduce the structural properties of Al films. So to attain thick Al films with large-area uniformity and high quality, the deposition angle should be precisely controlled.

show abstract

The effect of groove depth on the polarization behavior of an echelle grating

Yang

Zhang

et al. 2021

Optik

View full text Add to dashboard Cite

Reducing the line curvature error of mechanically ruled gratings by interferometric control

Cited by 17 publications

References 17 publications

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

Structural property investigation on obliquely deposited thick Al films

The effect of groove depth on the polarization behavior of an echelle grating

Contact Info

Product

Resources

About