Abstract-The CMOS technology scaling is leading to the integration of ever more complex systems on silicon. On the other hand, the shrinking of the devices and the reduction of the supply voltage have significantly increased the static power dissipation, that in power budgets of nanometer technologies, cannot be neglected any longer. In this work, we take advantage of the properties of the Residue Number System (RNS) to implement FIR filters with reduced static and dynamic power consumption. The results show that the RNS filters offer a reduction of 50% in static power dissipation and a total power reduction of 40% with respect to the corresponding conventional filters.
I. INTRODUCTIONThe objective of the work described in [1] was the comparison of the power consumption of Finite Impulse Response (FIR) filters implemented in the traditional two's complement system (TCS) and in the Residue Number System (RNS). The work in [1] took into account the dynamic power dissipation, which was by far the dominant portion of the energy consumed a few years ago.With the technology scaling, and the increased transistor's leakage due to sub-threshold currents, also the static power dissipation starts to play an important role in today's power budgets. Moreover, the increasing smaller CMOS transistors allow the hardware implementation of extra functions that before were executed in software, and the migration of complex system to portable devices. Because of the implementation of digital filters in ultra low power processors, such as the one used in tiny systems with limited available power, it is important the static power due to leakage is characterized and, possibly, reduced.To have an idea of the impact of the device's leakage on power dissipation, we implemented a multiplier, which is the basic block of a FIR filter, in a 0.18 µm, a 0.12 µm and in a 90 nm library. We used the same timing constraint, the delay of 25 inverters with fanout of 4 (a standard measure of delay across different technologies) in their respective libraries. The results, shown in Table I, indicate that the power dissipation due to leakage P stat increases both in absolute value and as the percentage of the overall power dissipation P T OT . By comparing the 0.18 µm and the 90 nm multipliers, we notice that P T OT has decreased of about 70% (mostly due to the scaling of V DD ), but the static part P stat has increased 14 times and its contribution to the total 40 times. Moreover, for the 90 nm implementation, if the multiplier is used as often as 1% of the processor usage time the static power dissipation becomes dominant. Therefore, the design