2015
DOI: 10.1063/1.4928534
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Reducing contact resistance in ferroelectric organic transistors by buffering the semiconductor/dielectric interface

Abstract: The reduction of contact resistance in ferroelectric organic field-effect transistors (Fe-OFETs) by buffering the interfacial polarization fluctuation was reported. An ultrathin poly(methyl methacrylate) layer was inserted between the ferroelectric polymer and organic semiconductor layers. The contact resistance was significantly reduced to 55 kΩ cm. By contrast, Fe-OFETs without buffering exhibited a significantly larger contact resistance of 260 kΩ cm. Results showed that such an enhanced charge injection wa… Show more

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Cited by 23 publications
(16 citation statements)
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“…Thus, the differences in the V‐poled and the textured poled devices arise from an improvement in the dielectric layer itself. It is not surprising that the contact resistance of TIPS‐pentacene FETs here is higher with PVDF‐TrFE compared with other dielectrics found in the literature; it is mainly due to the effect of polarization fluctuation at the semiconductor–dielectric interface …”
mentioning
confidence: 66%
“…Thus, the differences in the V‐poled and the textured poled devices arise from an improvement in the dielectric layer itself. It is not surprising that the contact resistance of TIPS‐pentacene FETs here is higher with PVDF‐TrFE compared with other dielectrics found in the literature; it is mainly due to the effect of polarization fluctuation at the semiconductor–dielectric interface …”
mentioning
confidence: 66%
“…For the PVDF-TrFE devices the contact resistance was roughly two orders of magnitude smaller than the channel resistance. The slightly higher contact resistance with PVDF-TrFE has been attributed to the polarization fluctuation at the semiconductor/ferroelectric interface, which broadens the trap charge distribution in the contact region of the semiconductor [34]. Furthermore, the contact resistance does not change much in the 100 K -300 K range [35], the temperature range used in this work.…”
Section: Temperature Dependent Fet Characteristicsmentioning
confidence: 86%
“…In addition, tremendous efforts have also been made to improve the interfacial interaction of PVDF/semiconductor or PVDF/gate electrode in PVDF based OFeFETs for minimizing structural defects 36,41,47,73,97,98 . Velusamy et al .…”
Section: Flexible Ofefet Devicesmentioning
confidence: 99%