“…RP and BP have very close standard enthalpy of formation and standard molar entropy. Common reactions with RP published from 1920's can be classified into five categories: 1) reactions with oxygen or high oxidative oxyacid 30,31 , 2) reactions with high oxidative metal ions or some kind of metals, [32][33][34][35] 3) reactions with halogens 36-38 , 4) strong Lewis base reactions [39][40][41][42][43] and 5) organic addition or substitution reactions 39,[42][43][44][45] . However, common photoresist used in lithography process is incompatible with the solution used in Lewis base reactions and organic addition/substitution reactions, and metal contact materials used for BP devices are incompatible high oxidative metal ion reactions.…”