Recording Messages on Nonplanar Objects by Cryogenic Electron‐Beam Writing

Abstract

The evolution of writing systems illustrates the development of information storage. Here, a unique way is demonstrated using sprayed anisole as the ink and a focused electron‐beam as a pen to record messages on a cooled substrate. Such an electron‐beam writing approach controls the thickness of remained anisole on the substrate. Optical interference at the visible region occurs thereby, resulting directly in a color print. Using discrete dose distribution, an 11‐step structure with a height difference of sub‐10 nm accuracy is written. A quinary pattern with a total thickness of 180 nm and unit square size of 500 nm is also written, implying information density beyond 1013 bits per cm3 (10 Tbit cm–3). Painting at the nanoscale is also enabled by importing grayscale images. In addition, the substrate can be extended from planar to nonplanar or flexible objects, such as an aluminum tape or a silver wire. Combining the grayscale lithographic nature and conformal coating of the ink, this writing process has great potential to store information on any surface.

Production and Patterning of Fluorescent Quantum Dots by Cryogenic Electron-Beam Writing

“…Currently, a few methods for patterning of fluorescent GQDs have been demonstrated. In addition to direct laser writing, inject printing and templated printing using fluorescent inks are also available for fabricating millimeter-sized anticounterfeiting marks. , However, due to the tiny spot size of a focused e-beam, our method or cryo-EBID can fabricate micrometer-sized fluorescent tags with a nanometer resolution, which is beneficial to enhance the anticounterfeiting level. , …”

“…30,31 However, due to the tiny spot size of a focused e-beam, our method or cryo-EBID can fabricate micrometersized fluorescent tags with a nanometer resolution, which is beneficial to enhance the anticounterfeiting level. 16,24 To investigate the origin of photoluminescence from irradiation products, we conducted high-resolution transmission electron microscope (HRTEM) imaging and laser desorption/ionization time-of-flight (LDI-TOF) mass spectroscopy measurements. Figure 3a presents an HRTEM image of products after e-beam irradiation on solid anisole with an electron dose of 3.2 mC/cm 2 (less than the saturation dose for saving time), where GQDs are discovered with sizes of 2−5 nm.…”

High-Throughput Direct Writing of Metallic Micro- and Nano-Structures by Focused Ga+ Beam Irradiation of Palladium Acetate Films

“…One of these rare examples is the case of 3D polymer-based scaffold structures for cell growth proliferation or polymers structured to serve as mechanical cantilever resonators, both fabricated by two-photon lithography. Another example is that of 3D cryogenic electron-beam writing for optical applications . The advantage of an electrically functional spin-coated film like Pd 3 (OAc) 6 is the simplicity of the overall process, consisting in only three steps: spin coating the substrate with a Pd precursor film, focused Ga + irradiation, and film development, as illustrated in Figure .…”

“…Another example is that of 3D cryogenic electron-beam writing for optical applications. 50 The advantage of an electrically functional spin-coated film like Pd 3 (OAc) 6 is the simplicity of the overall process, consisting in only three steps: spin coating the substrate with a Pd precursor film, focused Ga + irradiation, and film development, as illustrated in Figure 1. This is a significant improvement with respect to previous strategies using organometallic films, where postannealing steps were always needed to reach a metallic behavior.…”

Looking into a crystal ball: printing and patterning self-assembled peptide nanostructures

“…Ice-resist based patterning, which thus far has never been used for functionalizing self-assembled peptides, promises to be a path forward towards 3D (additive or subtractive) processing of dipeptides and other self-assembled biological structures. There has been a recent increase of interest in this technique for nanopatterning, [31][32][33][34][35][36][37] although the original idea of ice lithography was developed in 2005. 38 Ice lithography, which primarily uses amorphous ice as a sacrificial resist, offers a robust and generalizable path for patterning delicate, free-standing, or three-dimensional structures including biological macromolecules that deform or denature if exposed to conventional liquid-phase resist.…”