2014
DOI: 10.1016/j.polymer.2014.09.024
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Reconfigurable surface patterns on covalent adaptive network polymers using nanoimprint lithography

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Cited by 22 publications
(17 citation statements)
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“…In contrast, Ding and coworkers exploited the potential of the LAP for nanoimprinting. Specifically, they showed ≈400 nm features could be readily introduced on the LAP via contact printing and light induced stress relaxation (Figure c) . The impact of imprinting pressure and light exposure time on the structural evolution was investigated.…”
Section: Materials Innovations Via Covalent Bond Exchangementioning
confidence: 99%
“…In contrast, Ding and coworkers exploited the potential of the LAP for nanoimprinting. Specifically, they showed ≈400 nm features could be readily introduced on the LAP via contact printing and light induced stress relaxation (Figure c) . The impact of imprinting pressure and light exposure time on the structural evolution was investigated.…”
Section: Materials Innovations Via Covalent Bond Exchangementioning
confidence: 99%
“…If the functions of sensing and actuation are added to this list, the new material is considered a smart material [19]. Since the 1990s, a lot of research efforts have been devoted to the development [20] [21] [22] and industrial application [23] [24] of smart materials. Examples of some well-known smart materials are piezoelectric polymers [25], piezoelectric ceramics [26], shape memory alloys S. Rebouillat, F. Pla Journal of Biomaterials and Nanobiotechnology [27], electro-active polymers [28], covalent adaptive network polymers [22] and electrorheological and magneto rheological fluids [29].…”
Section: More Centrallymentioning
confidence: 99%
“…UV nanoimprint lithography (UV-NIL) has been extensively investigated due to the fabrication of not only nanopatterning for microelectronics but also functional materials for micro-electro-mechanical systems (MEMS) [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17]. UV-NIL utilizes UV light to cure a photoresist which was pressed using a patterned master mold to obtain the patterned structures.…”
Section: Introductionmentioning
confidence: 99%