Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films

Pawar, S.M.; Pawar, B.S.; Kim, Jihun; Joo, Oh‐Shim; Lokhande, C.D.

doi:10.1016/j.cap.2010.07.007

Cited by 327 publications

(138 citation statements)

References 312 publications

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“…[34]. Indeed, much reviews and literature, which describes the chemical bath deposition for both chalcogenide and oxide films, are found elsewhere [34][35][36].…”

Section: Chemical Bath Deposition Techniquementioning

confidence: 99%

Advance Deposition Techniques for Thin Film and Coating

Jilani¹,

Abdel-wahab²,

HosnyHammad³

2017

Modern Technologies for Creating the Thin-Film Systems and Coatings

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Thin films have a great impact on the modern era of technology. Thin films are considered as backbone for advanced applications in the various fields such as optical devices, environmental applications, telecommunications devices, energy storage devices, and so on . The crucial issue for all applications of thin films depends on their morphology and the stability. The morphology of the thin films strongly hinges on deposition techniques. Thin films can be deposited by the physical and chemical routes. In this chapter, we discuss some advance techniques and principles of thin-film depositions. The vacuum thermal evaporation technique, electron beam evaporation, pulsed-layer deposition, direct current/radio frequency magnetron sputtering, and chemical route deposition systems will be discussed in detail.

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“…[34]. Indeed, much reviews and literature, which describes the chemical bath deposition for both chalcogenide and oxide films, are found elsewhere [34][35][36].…”

Section: Chemical Bath Deposition Techniquementioning

confidence: 99%

Advance Deposition Techniques for Thin Film and Coating

Jilani¹,

Abdel-wahab²,

HosnyHammad³

2017

Modern Technologies for Creating the Thin-Film Systems and Coatings

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“…[22][23][24][25][26][27][28][29][30][31][32][33][34][35] The utilization of NiO x in such diverse applications has been accompanied by the development of various preparation methods and deposition techniques, aimed at producing NiO x -based materials with variable chemical composition, electrical resistivity, compactness and morphology. Examples include electrochemical deposition, 36 chemical vapor 37 and bath deposition, 38 spray pyrolysis, 39,40 sol-gel method, 14,23,25,41 hydrothermal synthesis, 29,42 and sputtering. 32 In this contribution, we propose a novel approach for the preparation of technologically relevant NiO x coatings for photo-electrochemical purposes using a microblasting technique.…”

Section: Introductionmentioning

confidence: 99%

Electrochemical characterization of NiO electrodes deposited via a scalable powder microblasting technique

Awais

Dini

MacElroy

et al. 2013

Journal of Electroanalytical Chemistry

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Publication information Journal of Electroanalytical Chemistry, Publisher Elsevier The UCD community has made this article openly available. Please share how this access benefits you. Your story matters! (@ucd_oa) Some rights reserved. For more information, please see the item record link above. In this contribution a novel powder coating processing technique (microblasting) for the fabrication of nickel oxide (NiOx) coatings is reported. ∼1.2 μm thick NiOx coatings are deposited at 20 mm2 s−1 by the bombardment of the NiOx powder onto a Ni sheet using an air jet at a speed of more than 180 m s−1. Microblast deposited NiOx coatings can be prepared at a high processing rate, do not need further thermal treatment. Therefore, this scalable method is time and energy efficient. The mechano-chemical bonding between the powder particles and substrate results in the formation of strongly adherent NiOx coatings. Microstructural analyses were carried out using SEM, the chemical composition and coatings orientation were determined by XPS and XRD, respectively. The electroactivity of the microblast deposited NiOx coatings was compared with that of NiOx coatings obtained by sintering NiOx nanoparticles previously sprayed onto Ni sheets. In the absence of a redox mediator in the electrolyte, the reduction current of microblast deposited NiOx coatings, when analyzed in anhydrous environment, was two times larger than that produced by higher porosity NiOx nanoparticles coatings of the same thickness obtained through spray coating followed by sintering. Under analogous experimental conditions thin layers of NiOx obtained by using the sol-gel method, ultrasonic spray-and electro-deposition show generally lower current density with respect to microblast samples of the same thickness. The electrochemical reduction of NiOx coatings is controlled by the bulk characteristics of the oxide and the relatively ordered structure of microblast NiOx coatings with respect to sintered NiOx nanoparticles here considered, is expected to increase the electron mobility and ionic charge diffusion lengths in the microblast samples. Finally, the increased level of adhesion of the microblast film on the metallic substrate affords a good electrical contact at the metal/metal oxide interface, and constitutes another reason in support of the choice of microblast as low-cost and scalable deposition method for oxide layers to be employed in electrochemical applications. Electrochemical characterization of NiO electrodes deposited via a scalable powder microblasting technique

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“…CBD allows adjustable control of size and surface density of nanoparticles, and can be used for preparation of high-quality nanocrystalline PbS and CdS films [4,6]. This method has been shown to allow control of stirring period, reaction time, bath temperature, pH of solution, complexing agent and impurities [7,8].…”

Section: Introductionmentioning

confidence: 99%

Effect of TEA on characteristics of CdS/PbS thin film solar cells prepared by CBD

Sattarian

Tohidi²,

Rahmatallahpur³

2016

Materials Science-Poland

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In this study, a solar cell with a glass/ITO/CdS/PbS/Al structure was constructed. Both window (CdS) and absorption (PbS) layers were deposited by chemical bath deposition (CBD) method. The CdS window layer was deposited on ITO-glass. The PbS nanocrystalline thin film was prepared with and without triethanolamine on CdS films at bath temperature of 25°C. CdS and PbS nanocrystals were identified using XRD and SEM. The cells are photosensitive in a large spectral range (at visible and near infrared regions). The cell with absorbing layer obtained from the bath without TEA has higher efficiency with the following parameters: the open circuit voltage (V oc ) is 275 mV, short circuit current (J sc ) is 12.24 mA/cm 2 , maximum voltage (V max ) is 165 mV and maximum current (J max ) is 7.11 mA/cm 2 with the efficiency η = 1.31 %, fill factor FF is 32 % under the illumination intensity of 90 mW/cm 2 . The cells have an area of 0.15 cm 2 .

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Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films

Cited by 327 publications

References 312 publications

Advance Deposition Techniques for Thin Film and Coating

Advance Deposition Techniques for Thin Film and Coating

Electrochemical characterization of NiO electrodes deposited via a scalable powder microblasting technique

Effect of TEA on characteristics of CdS/PbS thin film solar cells prepared by CBD

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