“…Controllable growth is especially critical to realizing the high-yield fabrication of high-quality 2D TMDC materials via a bottom-up approach including chemical vapor deposition (CVD), molecular beam epitaxy (MBE), and pulsed laser deposition (PLD), which demand a deep understanding of the growth mechanism during sequential growth stages, for example, precursors evaporation/decomposition/transport, adsorption and diffusion of adatoms, nucleation, attachment, and detachment to the growth frontier. − Generally, the growth process of 2D flakes/films by vapor deposition is a nonequilibrium process largely controlled by the competition between kinetics and thermodynamics, which is influenced by diverse growth factors, such as the growth temperature, gas flow rate, growth pressure, etc. , Therefore, it is truly crucial to balance various growth factors to achieve the controllable growth of 2D TMDC materials.…”