2018
DOI: 10.1039/c7cs00556c
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Recent progress in the assembly of nanodevices and van der Waals heterostructures by deterministic placement of 2D materials

Abstract: Designer heterostructures can be assembled layer-by-layer with unmatched precision thanks to the recently developed deterministic placement methods to transfer two-dimensional materials.

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Cited by 523 publications
(475 citation statements)
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“…S4). We note that the Raman spectra of TiS 2 flakes thinner than 65 nm have very low signal to noise ratio, what is probably related with sulfur vacancies and/or intercalated Ti ions, other defects in the titanium disulfide thin film structures, or more likely low absorption coefficient of TiS 2 , or faster structural degradation of very thin TiS 2 layers as observed for others 2D materials …”
Section: Calculated Parameters From Fit Of Equations  and To Temperamentioning
confidence: 70%
“…S4). We note that the Raman spectra of TiS 2 flakes thinner than 65 nm have very low signal to noise ratio, what is probably related with sulfur vacancies and/or intercalated Ti ions, other defects in the titanium disulfide thin film structures, or more likely low absorption coefficient of TiS 2 , or faster structural degradation of very thin TiS 2 layers as observed for others 2D materials …”
Section: Calculated Parameters From Fit Of Equations  and To Temperamentioning
confidence: 70%
“…Given the similarity between conventional processing methods for rigid (SiO 2 /Si) and flexible substrates, a more detailed description of these methods can be found in the respective section of other reviews …”
Section: D Materials Processing In Flexible Substratesmentioning
confidence: 99%
“…Besides the straightforward engineering of interface properties, stacks of vdW materials can support hybridized polaritonic modes. For example, in an h‐BN‐graphene heterostructure, graphene plasmons and h‐BN phonons hybridize into infrared surface plasmon–phonon polaritons .…”
Section: Polaritonic Dispersion Engineering In Van Der Waals Crystalsmentioning
confidence: 99%