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2012
DOI: 10.1002/ctpp.201200076
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Recent Progress in Complex Plasmas

Abstract: An overview on recent developments in the field of complex plasmas is presented. The focus is directed on the activities of research groups participating in the Collaborative Research Centre 24 “Fundamentals of Complex Plasmas” at the Universities in Greifswald and Kiel as well as at the Leibniz‐Institute for Plasma Research and Technology. This article summarizes results on strongly correlated dusty plasmas, reactive as well as electronegative plasmas and plasma‐surface interaction, and gives an introduction … Show more

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Cited by 13 publications
(15 citation statements)
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“…Our results are important for strongly correlated two-component charged particle systems in general [1] and for complex plasmas in particular [6,7]. Common to all these systems are collective phenomena resulting in a rich variety of phases.…”
Section: Summary and Concluding Remarksmentioning
confidence: 87%
“…Our results are important for strongly correlated two-component charged particle systems in general [1] and for complex plasmas in particular [6,7]. Common to all these systems are collective phenomena resulting in a rich variety of phases.…”
Section: Summary and Concluding Remarksmentioning
confidence: 87%
“…In this work, we go further into this field by concentrating on Ag–Cu cluster growth on thin polymer films during sputter deposition. The sputter deposition technique is a well‐established and widely used method, but as a specific application of complex plasmas it is still in the focus of basic research . Sputtering allows high deposition rates and, in contrast to many wet chemical methods, the alloy composition and filling factor can be varied over a broad range , .…”
Section: Introductionmentioning
confidence: 99%
“…processes in the plasma sheath, probe theory, and measurements near spacecrafts. However, it is the field of complex plasmas that provides unique opportunities to investigate these basic processes in detail [4].…”
Section: Introductionmentioning
confidence: 99%