Recent developments in dry processing for very-large- scale integration

Yasuda, Y.

doi:10.1016/0040-6090(82)90375-3

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Recent developments in dry processing for very-large- scale integration

Cited by 6 publications

References 27 publications

Effects of differential etching and masking resist preparation on the quality of the reactive-ion-etched aluminum and aluminum alloys

Effects of differential etching and masking resist preparation on the quality of the reactive-ion-etched aluminum and aluminum alloys

Physical and chemical mechanisms in the ion-enhanced etching of silicon

Dry Etching for Microelectronics-A Bibliography

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