Recent Development and Applications of Nanoimprint Technology

Abstract

Nanoimprint has emerged as a strong candidate of next-generation lithography techniques after more than a decade of intensive research and development. However, nanoimprint can be used as more than just a lithography technique. There are growing interests in using nanoimprint as an enabling fabrication technique for functional polymer processing and advanced multilayer polymer structures. In this review, recent applications of nanoimprint for nondestructive functional polymer patterning are summarized for polymer thin-film transistor, solar cell, and fuel cell applications. Improvement in reversal nanoimprint is presented. The improved technique is combined with optimized transfer-bonding technique for successful fabrication of three-dimensional multilayer polymer structures. Finally, a roll-to-roll nanoimprint technique is developed for low-cost high-throughput fabrication of micro-and nanostructures on a large scale.