Recent Advances in Positive Photoresists: Mechanisms and Fabrication
Muhammad Hassaan,
Umama Saleem,
Akash Singh
et al.
Abstract:Photoresists are fundamental materials in photolithography and are crucial for precise patterning in microelectronic devices, MEMS, and nanostructures. This paper provides an in-depth review of recent advancements in positive photoresist research and development, focusing on discussion regarding the underlying mechanisms governing their behavior, exploring innovative fabrication techniques, and highlighting the advantages of the photoresist classes discussed. The paper begins by discussing the need for the dev… Show more
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