2019
DOI: 10.1002/sia.6680
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Recent advances in dual mode charge compensation for XPS analysis

Abstract: Dual mode charge compensation has been used successfully for many years to enable X‐ray photoelectron spectroscopy (XPS) analysis of a variety of insulating samples. This approach uses a combination of low energy electrons and argon to compensate for positive charge build‐up during irradiation by X‐rays. Whilst this method works with no detectable side effects in most cases, it was recently reported that the chemical bonding states of some Cr(VI) oxides may be modified by prolonged exposure to the flood source… Show more

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Cited by 38 publications
(32 citation statements)
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“…See Fig. 2 of Edwards et al 29 for peaks fits to adequately and inadequately neutralized C 1s spectra from a rough fabric surface. Therefore, it is necessary to identify the occurrence of differential charging within your high-resolution spectra if the intention is to rely on spectra for identifying and quantifying oxidation states / functional groups.…”
Section: Recognizing Differential Chargingmentioning
confidence: 99%
“…See Fig. 2 of Edwards et al 29 for peaks fits to adequately and inadequately neutralized C 1s spectra from a rough fabric surface. Therefore, it is necessary to identify the occurrence of differential charging within your high-resolution spectra if the intention is to rely on spectra for identifying and quantifying oxidation states / functional groups.…”
Section: Recognizing Differential Chargingmentioning
confidence: 99%
“…As shown in Figure 5B, the LCMV sample V 2p peak can be analyzed into two peaks at 515.6 and 517.1 eV, which belonging to V 4+ and V 5+ , respectively. 27,33 After the indium ions were introduced in LCMV, the amount of V 4+ decreased to too tiny to observe. The mechanism of vanadate phosphor extremely depends on the electron between V 5+ and O 2− , where V 4+ does not contribute to photoluminescence intensity and quantum yield.…”
Section: Resultsmentioning
confidence: 99%
“…15 To minimize the Ar + ion flux reaching the interface, the extractor voltage of the instrument was reduced to 30 V following the results of a previous study. 16 The Na 0 plating rate was controlled by optimizing the FG parameters: the beam voltage was set to 3 V, and the current was set to 30 μA (the actual electronic current reaching the sample surface was measured using a Faraday cup and a value of ~4.8 μA was found; the Ar + current reaching the surface is ~10 nA).The base pressure of the instrument (FG off) is typically around 1 x 10 -9 mbar and rises to around 1 x 10 -8 mbar when the FG is activated. The change in pressure is related to the introduction of a small volume of Ar gas in the analysis chamber associated with the design of the dual mode flood source.…”
Section: X-ray Photoelectron Spectroscopy (Xps)mentioning
confidence: 99%