Materials Science in Semiconductor Processing
 2022
DOI: 10.1016/j.mssp.2022.107122
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Recent advances and future developments in PVA brush scrubbing cleaning: A review

Shihao Zhang
1
,
Fangyuan Wang
2
,
Baimei Tan
3
et al.
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Cited by 5 publications
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Diethylenetriamine and serine as synergists used in FA/OII based alkaline solution to realize enhanced cleaning efficiency of the organic corrosion inhibitor

Zhang
1
,
Wang
2
,
Tan
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et al. 2023
Colloids and Surfaces A: Physicochemical and Engineering Aspect
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Diethylenetriamine and serine as synergists used in FA/OII based alkaline solution to realize enhanced cleaning efficiency of the organic corrosion inhibitor

Zhang
1
,
Wang
2
,
Tan
3
et al. 2023
Colloids and Surfaces A: Physicochemical and Engineering Aspect
0
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0
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Research progress on the application of ceria nanoparticles as abrasives in dielectric layer CMP and post cleaning: Structure, morphology, doping, and mechanism

Han,
Liu,
Tan
et al. 2023
Colloids and Surfaces A: Physicochemical and Engineering Aspect
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Simulation of hydrophobic lotus leaves for preparing hydrophobic starch blending films based on starch-based graphite oxide carbon

Geng
1
,
Zhang
2
,
Lin
3
et al. 2023
Industrial Crops and Products
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