“…The defect density ( N trap ) can be calculated from the trap‐filling limit voltage ( V TFL ) by:
where L is the thickness of the perovskite film, q is the elementary charge, ε and ε 0 are the dielectric constants of perovskite and vacuum, respectively. [
29,30 ] The V TFL calculated from the I – V curves of SCLC decreases from 0.275 to 0.0908 V. Consequently, the trap density of the perovskite film is reduced from 3.54 × 10 15 to 1.17 × 10 15 cm –3 when 1.5% KBF 4 is added. This result matches well with the prolonged carrier lifetime measured by TRPL, indicating that the incorporation of KBF 4 could effectively reduce the defects in triple‐cation mixed perovskite.…”