Realization and Simulation of High-Aspect-Ratio Micro/Nanostructures by Proton Beam Writing

Abstract

Among the patterning technologies proposed and applied for the realization of high-aspect-ratio structures in the micro-and nanoscale, proton beam writing (PBW) is considered to be a valuable tool for maskless patterning of such structures owing to the unique ability of protons to maintain a straight path over long distances. In this work, the PBW capabilities are demonstrated through simulation results of fine structures in resist films. These results prove the capability of PBW to produce very tall structures with almost vertical sidewalls, with the aspect ratio limited practically only by the resist performance and the beam diameter provided. The performance of PBW is explored and proved through the patterning of an aqueous base developable negative chemically amplified resist (TADEP, thick aqueous base developable epoxy based resist). By employing PBW on a 2.0-mm-thick TADEP, patterns with 110 nm linewidth and an aspect ratio of 18 were resolved.

The Next Generation Focusing Lenses for Proton Beam Writing

“…During the reporting period the PI has also performed research which is related to the AOARD 06-4004 project "Studies into sub 100 nm resists for proton beam writing". This work resulted in 2 publications in collaboration with [7,8] and one publication in CIBA [9]. These three papers are also of importance to this project since they deal with either new resists or different approaches to PBW nanofabrication which is crucial for the future work on integration of templated nanowires into functional devices.…”

Simple Fabrication of Asymmetric High-Aspect-Ratio Polymer Nanopillars by Reusable AAO Templates

“…Making 1D nanoscopic structures especially with asymmetry, inspired by Mother Nature, is still a great challenge to overcome, although 1D nanomaterials such as asymmetric high-aspect-ratio polymer nanopillars have received considerable attention because of their wide potential applications including Gecko-mimicking dry adhesives, microfluidics, , water delivery, unidirectional wetting, , nanotemplates, − piezoelectric nanogenerators, , and micromechanical sensors. , Nanopillars are generally fabricated by photolithography, e-beam lithography, and soft lithography . Unfortunately, each of these techniques has their inherent bottlenecks for productivity.…”

Ion-Beam-Induced Luminescence Analysis as Diagnostic Tool for Microstructure Patterning on Diamond by Proton Beam Writing

“…Proton beam writing (PBW) is quite unique direct processing technique using an ion microbeam that enables the fabrication of micro-and nanostructures on a material that is not easily processed by normal chemical processes. 8,9) Several researchers have reported on the development of three-dimensional micrometer-sized structures on SU-8 with high aspect ratios. 10) Over the past years, there have been some papers on the use of ion beam implantation on diamonds.…”