Realization and characterization of an XUV multilayer coating for attosecond pulses

Suman, Michele; Monaco, G.; Pelizzo, Maria Guglielmina; Windt, David L.; Nicolosi, P.

doi:10.1364/oe.17.007922

Cited by 33 publications

(16 citation statements)

References 17 publications

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“…This can be achieved either by using a synchrotron beam line, the phase shift ϕ out n (ω) − ϕ in (ω) being obtained via the photocurrent technique [33][34][35][36], or a HHG beam line as in the present case.…”

Section: Methods Of Characterisationmentioning

confidence: 99%

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Theoretical and experimental studies of broadband phase-controlled attosecond mirrors

Divéki¹,

Bourassin-Bouchet²,

Rossi³

et al. 2014

Journal of Modern Optics

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We present procedures to develop and characterise chirped multilayer mirrors for attosecond pulses. The design procedure involves a simulated annealing optimisation algorithm to obtain a multilayer structure with the desired performances. The characterisation step requires the use of well-calibrated attosecond and synchrotron beam lines, allowing one to measure the amplitude and phase response of the mirror. We illustrate these approaches with a set of mirrors designed to have zero or negative dispersion. The remarkable agreement between theoretical and experimental performances validates this overall process, and demonstrates the capability of such mirrors to control the temporal profile of attosecond pulses. These tools and techniques for developing attosecond chirped mirrors will facilitate the generalisation of such components on attosecond experiments.

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Section: Methods Of Characterisationmentioning

confidence: 99%

“…Up to now, most multilayer mirrors for attosecond sources have been designed to work at near normal incidence [21,23,26,27]. However, as HHG sources are linearly polarised, it is in principle possible to increase the reflectivity by increasing the angle of incidence.…”

Section: Objectivesmentioning

confidence: 99%

Theoretical and experimental studies of broadband phase-controlled attosecond mirrors

Divéki¹,

Bourassin-Bouchet²,

Rossi³

et al. 2014

Journal of Modern Optics

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“…60 Short pulses with 170-130 as duration have been demonstrated in the region of 75-105 eV using Mo/Si multilayers with a reflectivity of 5%-10%. 61,62 Dispersion control above 100 eV can be achieved using different multilayers like Mo/La 63 and Mo/B 4 C 58 to avoid a discontinuous response at the Si-L absorption edge (100 eV). An extremely short pulse duration of sub-50 can be achieved by using a Mo/B 4 C/Si/B 4 C aperiodic multilayer with the spectrum from 20 to 112 eV, as shown in Figure 5.…”

Section: Broadband Multilayer For High Temporal Resolutionmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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“…The incidence angles on the sample range from 12.7 to 26.6 , with a mean angle of 20 . A plane mirror (Au coated silicon wafer, R $ 0.675 for grazing angle of 10 ) is positioned between the source and the objective in order to protect the Mo/Si multilayers against possible contamination from laser plasma debris. The samples were mounted on a two axis translation stage in order to move the surface with respect to the impinging beam spot.…”

Section: Samples and Damage Testing Proceduresmentioning

confidence: 99%

Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

Corso

Zuppella

Barkusky

et al. 2013

Journal of Applied Physics

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Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

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Realization and characterization of an XUV multilayer coating for attosecond pulses

Abstract: Multilayer techniques are used to obtain high reflectivity in the XUV spectral region. This work presents the realization of aperiodic multilayer mirrors for attosecond pulse compression and their characterization through reflectivity and photoemission spectroscopy measurements.

Cited by 33 publications

References 17 publications

Theoretical and experimental studies of broadband phase-controlled attosecond mirrors

Theoretical and experimental studies of broadband phase-controlled attosecond mirrors

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

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