The effects of both temperature and applied bias power during the sputtering of gadolinia-doped ceria (GDC) interlayers used as diffusion barriers in anode-supported solid oxide fuel cells (SOFC) were investigated. Scanning electron microscopy analysis revealed that increasing the applied bias power, in the 0-300 W range, progressively inhibits the columnar structure typically observed in sputtered films, favoring the deposition of dense interlayers. Such feature was mirrored in the electrochemical tests of single cells that demonstrated enhanced power density for SOFC with bias-assisted sputtered interlayers. In addition, similar electrochemical performances of fuel cells having interlayers deposited in the 400-800°C temperature range indicated that the applied bias allows for the sputtering of GDC protective interlayers at relatively lower temperatures than unbiased depositions. The presented results evidenced that bias-assisted sputtering is an effective technique for the fabrication of high-performance anode supported SOFC.