2011
DOI: 10.1016/j.snb.2009.12.067
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Realisation and characterisation of mass-based diamond micro-transducers working in dynamic mode

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Cited by 16 publications
(17 citation statements)
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References 32 publications
(52 reference statements)
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“…Patterning of seeded substrates was achieved via a plasma etching using an aluminum mask [135]. An alternative way was the wet chemical elimination of NDs with a buffer oxide etchant [136].…”
Section: Patterning and Seedingmentioning
confidence: 99%
“…Patterning of seeded substrates was achieved via a plasma etching using an aluminum mask [135]. An alternative way was the wet chemical elimination of NDs with a buffer oxide etchant [136].…”
Section: Patterning and Seedingmentioning
confidence: 99%
“…172 For instance, the patterning of the nanodiamonds can be achieved by a plasma etching of unwanted nanoparticles through the protection of an aluminum hard mask deposited by lithography. 173 Babchenko et al described a technique in which patterning of the seeds is obtained through the wet chemical removal of nanodiamonds with a SiO 2 layer on pre-defined areas by a buffer oxide etchant. 174,175 Selective growth on patterned seeding can also be achieved by a selective deposition of the seeds.…”
Section: Patternedmentioning
confidence: 99%
“…Furthermore, the Young's modulus of some carbon materials has been reported to range from a few tens of MPa to more than 1 TPa, depending on thickness and atom arrangement [6][7][8]. This triggered our interest in carbon materials, beyond graphene and its sp2 carbon hybridization, and hence into DLC as a core material for MEMS and not just for simple coatings [9].…”
Section: Introduction and Objectivesmentioning
confidence: 99%