1998
DOI: 10.1557/proc-528-195
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Real-Time X-Ray Scattering Study of Surface Dynamics on Au(111) During Ar+ Ion Irradiation

Abstract: X-ray scattering is used to investigate the surface dynamics on Au(111) during Ar+ ion irradiation. During 500 eV Ar+ ion irradiation, we observe the three regimes of step retraction, quasi-layer-by-layer removal and three dimensional rough erosion, analagous to molecular beam epitaxy. The quasi-layer-by-layer sputtering regime has been studied to identify similarities and differences in surface evolution during ion irradiation and molecular beam epitaxy. X-ray measurements suggest that 500 eV Ar+ ion irradiat… Show more

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Cited by 3 publications
(5 citation statements)
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“…28. These values are consistently lower than the results reported in the literature for Pt͑111͒ (nϭ0.28Ϯ0.02,␤Ͼ0.34), 3 Cu͑110͒ (nϭ0.26Ϯ0.02,␤ ϭ0.43Ϯ0.08), 5 Au (nϭ␤ϭ0.27Ϯ0.02), 6 and InP (nϭ0.26 Ϯ0.04,␤ϭ0.27Ϯ0.06). 7 In order to investigate the microscopic processes involved in ion sputtering of closed packed metals, we have performed KMC simulations of Cu͑111͒ erosion.…”
Section: Discussionsupporting
confidence: 39%
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“…28. These values are consistently lower than the results reported in the literature for Pt͑111͒ (nϭ0.28Ϯ0.02,␤Ͼ0.34), 3 Cu͑110͒ (nϭ0.26Ϯ0.02,␤ ϭ0.43Ϯ0.08), 5 Au (nϭ␤ϭ0.27Ϯ0.02), 6 and InP (nϭ0.26 Ϯ0.04,␤ϭ0.27Ϯ0.06). 7 In order to investigate the microscopic processes involved in ion sputtering of closed packed metals, we have performed KMC simulations of Cu͑111͒ erosion.…”
Section: Discussionsupporting
confidence: 39%
“…However, they did not agree well with experimental observations on metallic surfaces. In particular, they did not explain the rich variety of morphologies observed on single-crystal noble-metal surfaces [2][3][4][5][6] and several compound semiconductor surfaces. 1,7,8 The most notable morphological characteristic of sputter erosion is coarsening, the increase in the size of surface features with ion dose.…”
Section: Introductionmentioning
confidence: 88%
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“…As the incident angle is increased (Figures and , S2_30° to S4_80° surfaces), the stabilization of surface ripples is observed between 30° and 60°. This transition is typical of ion-induced nanopatterning effects on a variety of material classes including metals and semiconductors by “off-normal” irradiation. , Nanoscale ripples are formed due to an activation of the terrace diffusion barrier and the Ehrlich–Schwoebel barrier, , which can be driven by energy deposition closer to the surface, which is achieved by using a higher oblique incidence angle. Previous studies with low energy Ar + bombardment of Ti alloys, reported by Riedel et al, found some correlations with incidence angle on directionality and morphology of surface structures formed.…”
Section: Resultsmentioning
confidence: 99%