Real-Time Observation of Initial Thermal Oxidation on Si(110)-16x2 Surface by Photoemission Spectroscopy

Suemitsu, Maki; Togashi, Hajime; Konno, Atsushi; Yamamoto, Yoshihiko; Teraoka, Yuden; Yoshigoe, Akitaka; Enta, Yoshiharu

doi:10.1149/1.2356291

Cited by 2 publications

(1 citation statement)

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“…Recently, we have conducted real-time synchrotron radiation photoemission spectroscopy (SR-XPS) on initial oxidation of Si(110)-16 Â 2 surface, and found a rapid initial oxidization regime, which is not observed on other surfaces such as a Si(001)-2 Â 1 surface and a Si(111)-7 Â 7 surface. 3,4) We have further clarified that the O 1s peak from both room-temperature (RT)-and high-temperature-oxidized surfaces can be separated into four subpeaks. 3) However, the atomistic process of the initial oxidation, including the background of rapid initial oxidation, has been unclear so far.…”

Section: Introductionmentioning

confidence: 87%

Observation of Initial Oxidation on Si(110)-16×2 surface by Scanning Tunneling Microscopy

Togashi

Takahashi

Konno

et al. 2007

jjap

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The initial oxidation of a Si(110)-16×2 clean surface, both at room temperature (RT) and elevated temperatures (635, 660 °C), was investigated by scanning tunneling microscopy (STM). The effects of annealing (300 °C, 15 min) on an RT-oxidized surface were also investigated. On the RT-oxidized surface, a BN site, detected as a bright (B) spot in the filled-state image but as a normal (N) 16×2 adatom in the empty-state image, was observed. After annealing, DD, BD, and BB sites were found to exist in addition to the BN site. Here, DD (BD, BB) is a site that appears dark (bright, bright) in its filled-state image and appears dark (dark, bright) in its empty-state image. The relative population is DD>BD≈BN>BB. For oxidation at 635 °C, DD, BD, and BN sites were observed. For oxidation at 660 °C, only the BD site was observed. On the basis of these results, an atomistic process during the initial oxidation of the Si(110)-16×2 surface is discussed.

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Section: Introductionmentioning

confidence: 87%