Real time EPE measurement as a yield correlated metrology on advanced DRAM nodes
Taekwon Jee,
Joonsang You,
Hong-Goo Lee
et al.
Abstract:The Edge Placement Error (EPE) is growing concerns due to the complexity increases of process variation as the design rule shrinkage of DRAM device. The EPE is a well-accepted metric which can be derived from CD, Overlay and LER measurements from more than patterning layers that concerned [1] . Therefore, real time EPE measurement becomes a major factor to monitor and control the pattern fidelity.The pattern fidelity could be found from the edge placement measurement as a distance to design intent as possible … Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.