Abstract:International audienceIn the rapid thermal processing of a semi-conductor wafer, the temperature of the latter has to follow a preset time evolution profile while keeping spatial uniformity. A model-based open loop control strategy is presented in all its steps. A global and sufficiently accurate thermal model, based on the component interaction network, is used for the prediction of the required instantaneous heat flux distribution gained by the wafer. The same model is used to calculate the distribution of t… Show more
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