2007
DOI: 10.1143/jjap.46.l135
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Readout Durability Improvement of Super-Resolution Near-Field Structure Discs with PtOx–SiO2 Recording and GeNy Interfacial Layers

Abstract: We discuss the calculation of Fermi liquid parameters for the Anderson impurity model. An earlier calculation of de ChPtel is extended to a finite f-f-Coulomb interaction U and corrections of order l/Nf are studied, where Nf is the degeneracy of the localised level in the Anderson model. The lack of momentum conservation in the impurity model is found to be a complication, since the low-lying excited states are not automatically orthogonal in approximate calculations. In low-order l/Nf calculations the impurit… Show more

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Cited by 10 publications
(15 citation statements)
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“…The super-resolution near-field structure (super-RENS), in which the diffraction limitations of a laser can be circumvented, is considered a promising technology to increase the data storage capacity of optical media. A thin PtO X layer is often chosen as a mask or an active layer in super-RENS. On the other hand, focused ion beam or laser irradiation can be applied to high resistivity platinum oxide for metallization, patterning or writing electrical connections to the films. Interestingly, thermal decomposition behavior of platinum oxide has been proposed to be exploited even in a thermal lithography technique . According to the authors, this approach would be useful for fabricating nanoscale structures with a high aspect ratio over large areas.…”
Section: Introductionmentioning
confidence: 99%
“…The super-resolution near-field structure (super-RENS), in which the diffraction limitations of a laser can be circumvented, is considered a promising technology to increase the data storage capacity of optical media. A thin PtO X layer is often chosen as a mask or an active layer in super-RENS. On the other hand, focused ion beam or laser irradiation can be applied to high resistivity platinum oxide for metallization, patterning or writing electrical connections to the films. Interestingly, thermal decomposition behavior of platinum oxide has been proposed to be exploited even in a thermal lithography technique . According to the authors, this approach would be useful for fabricating nanoscale structures with a high aspect ratio over large areas.…”
Section: Introductionmentioning
confidence: 99%
“…Although fairly high laser power condition (P r = 3.0 mW) was used for the super-resolution readout, the layer kept the waveform of 97-nm and 340-nm combined marks nearly unchanged after at least 50,000 times readout and the CNR of 100-nm (monotone) marks stable to 268,000 times readout. [3,7].…”
Section: Discussionmentioning
confidence: 99%
“…Figure 8 shows the result of 100-nm (monotone) marks [3,7]. When there is no GeN y (without GeN y in the figure, P r = 2.8 mW), CNR dropped 3 dB after 75,000 times readout, but it improved by introducing GeN y (with GeN y in the figure, P r = 3.0 mW) to be 268,000 times.…”
Section: Super-resolution Readout Durability Of 100 Nm Monotone Marksmentioning
confidence: 99%
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“…However, the readout durability must still be improved for commercialization. Recently, the readout durability was improved by use of SiO 2 -PtO x instead of PtO x , because SiO 2 -PtO x has better antistress deformation and better thermal diffusion [14]. The importance of thermal diffusion was also identified by superresolution recording with Si as an underlayer [15].…”
Section: Introductionmentioning
confidence: 99%