Reactive sputter deposition of TiN<sub><i>x</i></sub>films, simulated with a particle-in-cell/Monte Carlo collisions model

Bultinck, Evi; Mahieu, Stijn; Depla, Diederik; Bogaerts, Annemie

doi:10.1088/1367-2630/11/2/023039

Cited by 23 publications

(24 citation statements)

References 68 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Nevertheless, calculation times can still rise to several weeks for describing magnetron discharges, certainly when some plasma chemistry is included, such as for reactive sputter‐deposition applications. The example illustrated here is a PIC‐MCC simulation applied to a planar dc magnetron, operating in an Ar/N 2 gas mixture with Ti target (cathode), used for the reactive sputter‐deposition of TiN x films 14, 15. In this case, beside electrons also several types of ions (Ar + , N

_{2}^{+}

, N + , Ti + ) and fast atoms (Ar f , Ti f , N f ) are described in the PIC‐MCC model.…”

Section: Particle‐in‐cell–monte Carlo Collisions (Pic‐mcc) Simulationsmentioning

confidence: 99%

“…Their further behavior, once thermalized, is described with a diffusion equation, including several production and loss terms (e.g., ionization). Details of this model can be found in 14. Figure 6a illustrates the calculated fluxes of sputtered Ti and N atoms from the target, as a function of radial position, for pure Ar gas (1 Pa) and for several different partial pressures of N 2 added to the (1 Pa) Ar gas.…”

Section: Particle‐in‐cell–monte Carlo Collisions (Pic‐mcc) Simulationsmentioning

confidence: 99%

See 1 more Smart Citation

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Bogaerts

Bultinck

Eckert

et al. 2009

Plasma Processes & Polymers

View full text Add to dashboard Cite

In this paper, an overview is given of different modeling approaches used for describing gas discharge plasmas, as well as plasma‐surface interactions. A fluid model is illustrated for describing the detailed plasma chemistry in capacitively coupled rf discharges. The strengths and limitations of Monte Carlo simulations and of a particle‐in‐cell–Monte Carlo collisions model are explained for a magnetron discharge, whereas the capabilities of a hybrid Monte Carlo–fluid approach are illustrated for a direct current glow discharge used for spectrochemical analysis of materials. Finally, some examples of molecular dynamics simulations, for the purpose of plasma‐deposition, are given.

show abstract

_{2}^{+}

, N + , Ti + ) and fast atoms (Ar f , Ti f , N f ) are described in the PIC‐MCC model.…”

Section: Particle‐in‐cell–monte Carlo Collisions (Pic‐mcc) Simulationsmentioning

confidence: 99%

Section: Particle‐in‐cell–monte Carlo Collisions (Pic‐mcc) Simulationsmentioning

confidence: 99%

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Bogaerts

Bultinck

Eckert

et al. 2009

Plasma Processes & Polymers

View full text Add to dashboard Cite

show abstract

“…We try to obtain this insight by computer simulations. Several modeling approaches exist for plasmas, such as analytical models [1,2], fluid models [3,4], the Boltzmann equation [5], Monte Carlo (MC) [6,7], and particle-in-cell MC simulations [8,9], collisional-radiative (CR) models [10,11], as well as hybrid models, which are a combination of the above models [12][13][14]. For describing the plasma chemistry, fluid modeling is, however, the most suitable approach, because a large number of plasma species and chemical reactions can be taken into ac-In these equations, n, j, and R stand for the species number density, flux, and production or loss rate.…”

Section: Introductionmentioning

confidence: 99%

Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas

Bogaerts

Bie

Eckert

et al. 2010

Pure and Applied Chemistry

View full text Add to dashboard Cite

In this paper, an overview is given of modeling activities going on in our research group, for describing the plasma chemistry and plasma-surface interactions in reactive plasmas. The plasma chemistry is calculated by a fluid approach or by hybrid Monte Carlo (MC)-fluid modeling. An example of both is illustrated in the first part of the paper. The example of fluid modeling is given for a dielectric barrier discharge (DBD) in CH 4 /O 2 , to describe the partial oxidation of CH 4 into value-added chemicals. The example of hybrid MC-fluid modeling concerns an inductively coupled plasma (ICP) etch reactor in Ar/Cl 2 /O 2 , including also the description of the etch process. The second part of the paper deals with the treatment of plasma-surface interactions on the atomic level, with molecular dynamics (MD) simulations or a combination of MD and MC simulations.

show abstract

“…A detailed explanation of the PIC/MCC model used in this work can be found in [10,11]. The MC model is based on the same principles, and hence, it will not be explained in detail here.…”

mentioning

confidence: 99%

The origin of Bohm diffusion, investigated by a comparison of different modelling methods

Bultinck¹,

Mahieu²,

Depla³

et al. 2010

J. Phys. D: Appl. Phys.

Self Cite

View full text Add to dashboard Cite

‘Bohm diffusion’ causes the electrons to diffuse perpendicularly to the magnetic field lines. However, its origin is not yet completely understood: low and high frequency electric field fluctuations are both named to cause Bohm diffusion. The importance of including this process in a Monte Carlo (MC) model is demonstrated by comparing calculated ionization rates with particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. A good agreement is found with a Bohm diffusion parameter of 0.05, which corresponds well to experiments. Since the PIC/MCC method accounts for fast electric field fluctuations, we conclude that Bohm diffusion is caused by fast electric field phenomena.

show abstract

Reactive sputter deposition of TiN_xfilms, simulated with a particle-in-cell/Monte Carlo collisions model

Cited by 23 publications

References 68 publications

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas

The origin of Bohm diffusion, investigated by a comparison of different modelling methods

Contact Info

Product

Resources

About

Reactive sputter deposition of TiNxfilms, simulated with a particle-in-cell/Monte Carlo collisions model

Cited by 23 publications

References 68 publications

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Computer Modeling of Plasmas and Plasma‐Surface Interactions

Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas

The origin of Bohm diffusion, investigated by a comparison of different modelling methods

Contact Info

Product

Resources

About

Reactive sputter deposition of TiN_xfilms, simulated with a particle-in-cell/Monte Carlo collisions model