Abstract:Ultra-high-purity
propylene glycol monomethyl ether acetate (PGMEA)
is required as an electronic-grade solvent to meet the stringent requirements
of the rapidly developing semiconductor industry. The high demand
for ultra-high-purity PGMEA has created the need for an efficient
sustainable process for reducing energy consumption as well as satisfying
tight waste management regulations. Here, a potentially sustainable
and novel process for efficient continuous electronic-grade PGMEA
manufacturing is presented. T… Show more
“…PGMEA is one of the most important solvents for photoresist processing in the semiconductor industry. It has relatively low environmental toxicity but all of the reactants required in its manufacture are from non-renewable sources [ 151 ]. Carcinogens used in photoresists (PR) products include cyclohexanone, ethylbenzene, pyridine, and 1,4 dioxane [ 34 ].…”
Section: Bottom-up Versus Top-down Lithographymentioning
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.
“…PGMEA is one of the most important solvents for photoresist processing in the semiconductor industry. It has relatively low environmental toxicity but all of the reactants required in its manufacture are from non-renewable sources [ 151 ]. Carcinogens used in photoresists (PR) products include cyclohexanone, ethylbenzene, pyridine, and 1,4 dioxane [ 34 ].…”
Section: Bottom-up Versus Top-down Lithographymentioning
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.
“…Recently, an attempt toward a sustainable process of continuous PGMEA production was reported [7]. First, a base-catalyzed reaction between propylene oxide (PO) and methanol (MeOH) was used to synthesize PGME.…”
Section: Introductionmentioning
confidence: 99%
“…At the top RD product, the more volatile mixture, MeAc and MeOH, as a binary azeotrope, was introduced into the low pressure distillation column section. Figure 1 presents a schematic diagram of the novel PGMEA production process [7]. That study showed that intensified RD and pressure swing distillation (PSD) techniques could increase the PGMEA conversion; thus, the energy requirement was significantly decreased compared to that of the traditional process [7].…”
Section: Introductionmentioning
confidence: 99%
“…Figure 1 presents a schematic diagram of the novel PGMEA production process [7]. That study showed that intensified RD and pressure swing distillation (PSD) techniques could increase the PGMEA conversion; thus, the energy requirement was significantly decreased compared to that of the traditional process [7]. However, that study focused only on enhancing the performance of the RD and PSD, whereas the energy-intensive distillation unit was not considered.…”
Section: Introductionmentioning
confidence: 99%
“…However, that study focused only on enhancing the performance of the RD and PSD, whereas the energy-intensive distillation unit was not considered. In fact, C1 and C2 (Figure 1) consumed 71.1% of the total energy required for the PGMEA process [7]. in RD column has two major drawbacks.…”
Propylene glycol monomethyl ether acetate (PGMEA) is a commonly used solvent in the rapidly developing semiconductor industry. Ultra-high purity PGMEA is required for this ultra-precision industry and to satisfy the current strict waste management regulations. The traditional PGMEA production process consumes considerable energy and has a high production cost. In this study, a novel heat integrated and intensified design, which applies a dividing wall column, reactive distillation, and pressure swing techniques, was proposed for improving the energy efficiency and reducing the cost of PGMEA production. Heat integration was applied to maximize the heat recovery of the process. All processes were simulated using the commercial simulator Aspen Plus V11. The economic and environmental parameters of the process alternative were assessed for a fair comparison with the conventional process. The results showed that heat integration of the optimal pressure swing-based reactive distillation and dividing wall column processes could reduce the energy requirement and TAC by 29.5%, and 20.8%, respectively, compared to that of the optimal conventional process. The improved design provides a strong basis for achieving more sustainable PGMEA production.
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