Reactive Plasma Processes for the Fabrication of Nano-Dimensional Semiconductor Devices

Tandon, U. S.

doi:10.4028/www.scientific.net/ssp.55.167

Cited by 1 publication

(1 citation statement)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Then several technologies involving angle-resolved deposition and reactive ion etching (RIE) , have been suggested to adjust the size and the shape of nanostructures, and control the surface morphology and roughness of the template. In fact, many kinds of active species have been detected during the RIE process, such as radicals, atoms, and ions, which can react easily with the substrate. , Therefore, a delicately designed substrate can be further functionalized after the RIE process and have ingenious application, which has been neglected in the previous research. Here, we demonstrate a simple and versatile preparation strategy combining CL with RIE process for the fabrication of nanoring structures on Fe coated substrate, and the nanorings can be further used as masks to construct aligned carbon nanotube (CNT) arrays.…”

Section: Introductionmentioning

confidence: 99%

Nanoring Arrays on Fe Coated Substrate: Formation and Guidance for the Growth of Hierarchical CNTs

Luo

Zhang

et al. 2015

Langmuir

View full text Add to dashboard Cite

In this article, we report the formation of nanoring structures on Fe coated substrate and their application in guiding the growth of carbon nanotube (CNT) patterns with hierarchical structures. The formation of nanorings involves the etching of polystyrene (PS) monolayer colloidal crystals (MCCs) under reactive ion etching (RIE), and the redeposition and cross-linkage of the active degradation products at the contact line between the MCCs and the substrate. After washing out the MCCs, insoluble nanorings with hexagonal order on the substrate are developed. The RIE process can control the morphology of the nanorings, as well as the distribution of the Fe element on the substrate; thus, a continuous Fe layer and separated Fe discs on the substrate are created on substrate after washing, depending on the etching time and the shield of MCCs. The surviving Fe element can work as the catalyst to initiate the in situ growth of aligned CNTs in the following chemical vapor deposition (CVD) process, while the Fe element underneath the nanorings keep its inactivity. Eventually, CNT patterns with hierarchical structures are formed. One level originates from the surviving Fe layer; the other level is templated from the nanoring structures, which cause the blank area in the CNT bundles.

show abstract