Reactive molecular plasmas

Ricard, A.; Monna, V.

doi:10.1088/0963-0252/11/2/314

Cited by 23 publications

(25 citation statements)

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“…Several methods have appeared to measure the O-atom density in highly dissociated oxygen. The methods include optical spectroscopy [12], [13], mass spectrometry [14], [15], gas titration [16], [17], and catalytic probes [18]. The latter was found to have some advantages over other techniques, as catalytic probes enable real/time measurements and do not disturb the original concentration of O atoms.…”

Section: Introductionmentioning

confidence: 99%

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

Cvelbar

Mozetič

Ricard

2005

IEEE Trans. Plasma Sci.

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Fiber-optic catalytic probes were used to measure the neutral oxygen density in a postglow of a plasma reactor. Plasma was excited with an inductively coupled radio frequency generator with the frequency of 27.12 MHz and the power of 300 W. Plasma density was measured with a double Langimur probe, while the density of neutral oxygen atoms was measured with four different fiber optic catalytic probes (Ni, Cu, Co, Nb), and NO titration. The measurements were performed at different pressure from 10 to 400 Pa. The density of neutral atoms was used to calculate recombination coefficients and their variations with plasma parameters. The results of neutral O-atom density and recombination coefficients were explained.

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Section: Introductionmentioning

confidence: 99%

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

Cvelbar

Mozetič

Ricard

2005

IEEE Trans. Plasma Sci.

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“…The second part of this statement is in a good agreement with the increase of γ p (Table ) and XPS data discussed further (Table ), while features of the surface etching were determined by the type of electrode (anode or cathode) and initial characteristics of chitosan sample. DC discharge treatment causes separation of the plasma active components (electrons and ions), resulting in different etching processes occurring at the cathode and anode . We assume that plasma modification of chitosan films on the anode led mainly to local destruction of “soft” amorphous regions by plasma electrons, while treatment on the cathode could cause more significant etching by ions.…”

Section: Resultsmentioning

confidence: 99%

DC Discharge Plasma Modification of Chitosan Films: An Effect of Chitosan Chemical Structure

Демина

Drozdova

Yablokov

et al. 2015

Plasma Processes & Polymers

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Surface plasma treatment of chitosan films is a widely used technique to control a variety of their properties, such as permeability, hemostatic activity and ability to support cell adhesion, proliferation and growth. Among other factors to be controlled, the chemical structure of initial chitosan is rarely taken into consideration. This work is aimed to highlight this factor by the example of low pressure direct-current discharge of various chitosan film samples. Contact angle measurements, X-ray photoelectron spectroscopy and scanning electron microscopy revealed differences in the film surface properties of the initial and plasma-treated films. The effect of the plasma treatment on cell viability of L929 mouse fibroblasts was studied by MTT-assay.

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“…This emission comes from the NO γ system between 200 and 300 nm and from the NO β system between 300 and 400 nm. The excited NO(B) states from which the UV radiation is produced (transition from NO(B) to NO(X)) are created in the late afterglow region by the long-lived atom species [6,8] :…”

Section: Experimental Setup and Methodsmentioning

confidence: 99%

“…where M again indicates a third body. In this context, the intensity of the NO β system becomes [8,9] :…”

Section: Experimental Setup and Methodsmentioning

confidence: 99%

Interaction of N and O atoms with hardwood and softwood surfaces in the flowing afterglow of N₂‐O₂ microwave plasmas

Prégent

Robert-Bigras

Stafford

2018

Plasma Processes & Polymers

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The interaction between hardwood (Sugar Maple) and softwood (Black Spruce) surfaces and N and O atom species produced in the flowing late afterglow of a surface‐wave microwave plasma column in N2‐O2 gas mixtures was investigated using a NO titration method combined with optical emission spectroscopy. Results showed two distinct atom loss regimes following their interaction with wood surfaces: a recombination regime at low oxygen concentrations (<1% O2) and an etching regime by O atoms at higher oxygen concentrations (>1% O2). The etching reaction was confirmed by surface profilometry measurements, with the formation of sub‐millimetre trenches between low‐density early wood and high‐density late wood regions. Recombination dynamics of O and N atoms over smooth and roughened wood regions are also compared.

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Reactive molecular plasmas

Cited by 23 publications

References 0 publications

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

DC Discharge Plasma Modification of Chitosan Films: An Effect of Chitosan Chemical Structure

Interaction of N and O atoms with hardwood and softwood surfaces in the flowing afterglow of N₂‐O₂ microwave plasmas

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Reactive molecular plasmas

Cited by 23 publications

References 0 publications

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

Characterization of oxygen plasma with a fiber optic catalytic probe and determination of recombination coefficients

DC Discharge Plasma Modification of Chitosan Films: An Effect of Chitosan Chemical Structure

Interaction of N and O atoms with hardwood and softwood surfaces in the flowing afterglow of N2‐O2 microwave plasmas

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Interaction of N and O atoms with hardwood and softwood surfaces in the flowing afterglow of N₂‐O₂ microwave plasmas