1968
DOI: 10.1007/bf01295401
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Reaction thermodynamics in the SiO2-SiC system

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Cited by 13 publications
(5 citation statements)
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“…SiO 2 impurity can be removed by reaction between SiC and SiO 2 at temperatures above 1700 • C. This processing is often called as self-cleaning of SiC [22]. B 2 O 3 will be vaporized significantly at temperatures above 1200 • C. Unlike B 2 O 3 , HfO 2 with melting point of 2810 • C has very low vapor pressure in the sintering temperature range.…”
Section: Oxygen Contentmentioning
confidence: 98%
“…SiO 2 impurity can be removed by reaction between SiC and SiO 2 at temperatures above 1700 • C. This processing is often called as self-cleaning of SiC [22]. B 2 O 3 will be vaporized significantly at temperatures above 1200 • C. Unlike B 2 O 3 , HfO 2 with melting point of 2810 • C has very low vapor pressure in the sintering temperature range.…”
Section: Oxygen Contentmentioning
confidence: 98%
“…These are, respectively, works on H 2 /N 2 O mixtures, on N 2 O at high concentration, and on N 2 O diluted in inert gases. It should be mentioned that there are several works related to the title reaction which will not be further discussed here. These early studies have been criticized and discounted in BDH73; see the discussion there regarding reaction R1.…”
Section: Evaluation Of Literature Datamentioning
confidence: 99%
“…Except for major parts of HfC and SiC, green pellets of HfC–SiC always contain some oxygen impurities (HfO 2 and SiO 2 ) and residual free carbon (C), the reactions would occur at different temperatures during sintering process of HfC–SiC, according to thermodynamic calculation and previous report:SiO2+3CSiC+2CO(g)(T>1530C,PCO=1atm,ΔG<0) SiC+2SiO23SiO(g)+CO(g)(T>˜1700C,PSiO=3PCO=0.25atm,ΔG<0) HfO2+(3x)CHfC1x+2CO(g)(for HfC1.0,T>1650C,PCO=1atm,ΔG<0) (3x)HfC+xHfO2<...>…”
Section: Resultsmentioning
confidence: 94%