Abstract:On-surface solution phase chemical reactions, which are inherently
amenable to scale-up, provide a pathway towards overcoming challenges
present in gas phase processes for ultradoping of Si, a process that
introduces unprecedented concentration of dopant. Ultradoping, which can
only be achieved with a direct chemical bond between dopant and Si,
fundamentally changes the electronic properties of Si, making it a
promising next-generation electronic material. Traditional processes for
solvent-based chemica… Show more
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