2004
DOI: 10.1063/1.1803950
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Reach-through band bending in semiconductor thin films

Abstract: We describe a phenomenon of reach-through band bending in thin film semiconductors. It occurs through generation of defects that change the semiconductor work function. This translates the effect of the metal presence through the semiconductor film and induces a Schottky barrier in another semiconductor tangent to the film on the opposite side (reach-through band bending). We have found experimental evidence of this effect in CdTe photovoltaics.

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Cited by 15 publications
(9 citation statements)
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“…9 In superstrate solar cell design a buffer layer deposited on a conductive transparent electrode is often used to enhance the open circuit voltage and the fill factor, prevent the appearance of a potential barrier at the interface with conductive oxides 10 or induce charge redistribution in a solar cell via creation of defects in a CdS layer. 11 In the latter case, a solar cell comprising a conductive transparent electrode and a CdTe/CdS HJ can function as a metal-oxide-semiconductor (MOS) structure due to a significant density of acceptor traps in CdS. Therefore, using different buffer layers one can expect to alter electronic properties of CdS and change the electrostatic conditions at the CdTe/CdS heterojunction.…”
Section: Introductionmentioning
confidence: 99%
“…9 In superstrate solar cell design a buffer layer deposited on a conductive transparent electrode is often used to enhance the open circuit voltage and the fill factor, prevent the appearance of a potential barrier at the interface with conductive oxides 10 or induce charge redistribution in a solar cell via creation of defects in a CdS layer. 11 In the latter case, a solar cell comprising a conductive transparent electrode and a CdTe/CdS HJ can function as a metal-oxide-semiconductor (MOS) structure due to a significant density of acceptor traps in CdS. Therefore, using different buffer layers one can expect to alter electronic properties of CdS and change the electrostatic conditions at the CdTe/CdS heterojunction.…”
Section: Introductionmentioning
confidence: 99%
“…The characteristics of the deep defect levels in the band gap of polycrystalline CdTe may be influenced by strain in the GBs, thus, suggesting high sensitivity of doping in CdTe to a particular deposition process and conditions of post-deposition anneals. CdTe is known as a "hard-to dope" semiconductor [8] implying that the concept of a metal-oxide-semiconductor (MOS) structure implemented either by restricting the dimensions of a metal electrode [9] or modifying charge trapping in the interfacing CdS [10] can lead to the electric field screening and enable modulation of the surface band bending in CdTe. In the latter case, intentional doping of CdS with copper, which diffuses along the grain boundaries from the back contact of CdTe, or incorporation of a resistive ZnO buffer layer next to CdS in the solar cell structure have been suggested to increase the effective screening length in ZnO/CdS layers and result in the higher values of the open circuit voltage (V OC ) in CdS/CdTe solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…It should also be noted that CdS is a rather thin low-resistivity low-compensated ntype semiconductor, so that the SCR is located practically only in the p-CdTe layer (see, e.g. [8,47]). So, for the CdS/ CdTe heterostructure, a schematic energy-band diagram of an abrupt asymmetric p-n junction or a Schottky diode can be applied (Fig.…”
Section: Recombination Losses and Requirements Imposed On Thickness Omentioning
confidence: 99%
“…The diffusion component of the quantum efficiency g dif is also found from the continuity equation. Taking into account recombination at the back surface of the CdTe layer and the boundary condition Dn = 0 at x = W, it can be written [44][45][46][47][48] where A = (d -W)/L n , D n and L n is the electron diffusion coefficient and diffusion length, S b is the velocity of recombination at the rear surface of the CdTe layer, and d is the thickness of the CdTe layer.…”
Section: Recombination Losses and Requirements Imposed On Thickness Omentioning
confidence: 99%