2021
DOI: 10.1109/ted.2021.3118990
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Rational Superlattice Electron Blocking Layer Design for Boosting the Quantum Efficiency of 371 nm Ultraviolet Light-Emitting Diodes

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Cited by 7 publications
(2 citation statements)
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“…To obtain a high-quality AlN/sapphire template, several growth techniques have been investigated, including epitaxial lateral overgrowth (ELOG) technology, pendeo-epitaxy, and facet-controlled ELOG [42,43] . Employing a low-temperature (LT) GaN or AlN buffer layer is an important method to diminish the lattice mismatch between the epilayers and sapphire substrate [44][45][46][47] . Our group found that densities of both screw dislocations and edge dislocations in the GaN epilayer grown on a PSS were much less than that of the GaN epilayer grown on an FSS [48] .…”
Section: Aln/sapphire Templatementioning
confidence: 99%
“…To obtain a high-quality AlN/sapphire template, several growth techniques have been investigated, including epitaxial lateral overgrowth (ELOG) technology, pendeo-epitaxy, and facet-controlled ELOG [42,43] . Employing a low-temperature (LT) GaN or AlN buffer layer is an important method to diminish the lattice mismatch between the epilayers and sapphire substrate [44][45][46][47] . Our group found that densities of both screw dislocations and edge dislocations in the GaN epilayer grown on a PSS were much less than that of the GaN epilayer grown on an FSS [48] .…”
Section: Aln/sapphire Templatementioning
confidence: 99%
“…24 In addition, thin AlInGaN superlattices have also been recently reported experimentally. 25 Recently, high output AlGaN microLEDs have also been reported. 26 Researchers have also used patterned substrates as well as nucleation layers to improve ultraviolet LEDs.…”
mentioning
confidence: 99%