Rapid turnaround scanning probe nanolithography

Paul, P.; Knoll, Armin; Holzner, Felix; Despont, M.; Duerig, Urs

doi:10.1088/0957-4484/22/27/275306

Cited by 78 publications

(66 citation statements)

References 29 publications

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“…3b contain 880 x 880 pixels and were written in less than 12 s, demonstrating the high throughput of the approach. 29 Throughputs are in the range of 5 x 10 4 µm 2 /h ( Fig. 2b).…”

Section: Thermal and Thermochemical Splmentioning

confidence: 95%

Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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“…3b contain 880 x 880 pixels and were written in less than 12 s, demonstrating the high throughput of the approach. 29 Throughputs are in the range of 5 x 10 4 µm 2 /h ( Fig. 2b).…”

Section: Thermal and Thermochemical Splmentioning

confidence: 95%

Advanced scanning probe lithography

2014

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“…49 The current state-ofthe-art in micro-and nanofabrication technology allows the construction of nanodevices in very small dimensions and the creation of different topologies. [50][51][52][53][54][55][56][57][58][59] Multitudes of techniques are now used for the construction process, although the field has not yet reached sufficient maturity. Commonly used methods require modification of a substrate via several processes such as thin film deposition (an additive process to the substrate), pattern transfer lithography (also an additive process to the substrate), selective etching (an ''erosive'' process of the substrate) and injection-moulding (which can be applied onto silicon, glass or polymer substrates).…”

Section: Major Requirements Of Novel Biomaterialsmentioning

confidence: 99%

Amyloid-based nanosensors and nanodevices

2014

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Self-assembling amyloid-like peptides and proteins give rise to promising biomaterials with potential applications in many fields. Amyloid structures are formed by the process of molecular recognition and self-assembly, wherein a peptide or protein monomer spontaneously self-associates into dimers and oligomers and subsequently into supramolecular aggregates, finally resulting in condensed fibrils. Mature amyloid fibrils possess a quasi-crystalline structure featuring a characteristic fiber diffraction pattern and have well-defined properties, in contrast to many amorphous protein aggregates that arise when proteins misfold. Core sequences of four to seven amino acids have been identified within natural amyloid proteins. They are capable to form amyloid fibers and fibrils and have been used as amyloid model structures, simplifying the investigations on amyloid structures due to their small size. Recent studies have highlighted the use of self-assembled amyloid-based fibers as nanomaterials. Here, we discuss the latest advances and the major challenges in developing amyloids for future applications in nanotechnology and nanomedicine, with the focus on development of sensors to study protein-ligand interactions.

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“…The unique capabilities of t-SPL are: (i) high-resolution patterning of complex geometries without wet development and proximity correction, (ii) in-situ imaging with the same tip before or after the patterning [132,133], (iii) 3D patterning with ~1 nm vertical accuracy, (iv) overlay with high accuracy relative to structures buried under the resist [133], and (v) no damage of sensitive materials as in a charged particle beam. Particularly, the non-damaging character of the substrate, its CMOS compatibility, and 3D nanoscale capability makes t-SPL technique a promising approach for future nanotechnology and electronic applications.…”

Section: Tip Nano-writingmentioning

confidence: 99%

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

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The evolution of optical microscopy from an imaging technique into a tool for materials modification and fabrication is now being repeated with other characterization techniques, including scanning electron microscopy (SEM), focused ion beam (FIB) milling/imaging, and atomic force microscopy (AFM). Fabrication and in situ imaging of materials undergoing a three-dimensional (3D) nano-structuring within a 1−100 nm resolution window is required for future manufacturing of devices. This level of precision is critically in enabling the cross-over between different device platforms (e.g. from electronics to micro-/ nano-fluidics and/or photonics) within future devices that will be interfacing with biological and molecular systems in a 3D fashion. Prospective trends in electron, ion, and nano-tip based fabrication techniques are presented.

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Rapid turnaround scanning probe nanolithography

Cited by 78 publications

References 29 publications

Advanced scanning probe lithography

Advanced scanning probe lithography

Amyloid-based nanosensors and nanodevices

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

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