2007
DOI: 10.1155/2007/83657
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Rapid Thermal Annealing and Hydrogen Passivation of Polycrystalline Silicon Thin-Film Solar Cells on Low-Temperature Glass

Abstract: The changes in open-circuit voltage (Voc), short-circuit current density (Jsc), and internal quantum efficiency (IQE) of aLuminum induced crystallization, ion-assisted deposition (ALICIA) polycrystalline silicon thin-film solar cells on low-temperature glass substrates due to rapid thermal anneal (RTA) treatment and subsequent remote microwave hydrogen plasma passivation (hydrogenation) are examined.Vocimprovements from 130 mV to 430 mV,Jscimprovements from 1.2 mA/cm2to 11.3 mA/cm2, and peak IQE improvements f… Show more

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Cited by 20 publications
(17 citation statements)
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References 18 publications
(26 reference statements)
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“…When the same sample is measured from the glass side, the V oc becomes 485 mV mainly due to lower reflection from the glass side thanks to the SiN layer. This high V oc value is comparable to that obtained after rapid thermal annealing [7,8].…”
Section: Electronic Qualitysupporting
confidence: 82%
See 1 more Smart Citation
“…When the same sample is measured from the glass side, the V oc becomes 485 mV mainly due to lower reflection from the glass side thanks to the SiN layer. This high V oc value is comparable to that obtained after rapid thermal annealing [7,8].…”
Section: Electronic Qualitysupporting
confidence: 82%
“…The RTA (rapid thermal annealing) process was extensively applied for the crystallization of amorphous silicon on glass for solar cells and thin film transistors (TFTs) applications [1][2][3]. In case of polycrystalline silicon based solar cells, the RTA process has been employed to reduce the point defects present in the poly-Si layers and to activate the dopant elements [4][5][6][7][8].…”
Section: Introductionmentioning
confidence: 99%
“…Both postdeposition treatments (RTA and hydrogenation) are essential processes for achieving appreciable performance of SPC poly-Si solar cells on glass [10,11]. The total thickness of the poly-Si films is about 2 μm.…”
Section: Background: Eva Device Structurementioning
confidence: 99%
“…For bulk silicon, either thermal annealing in a hydrogen atmosphere or wet chemical processing in HF solution can provide a good hydrogen-passivated surface [49,50], however, both methods are inapplicable for Si NCs. Thermal annealing at temperatures greater than 800 1C has a high risk of sintering the particles together.…”
Section: Results and Discussion Si Ncs Surface Passivationmentioning
confidence: 99%