Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system

Tanaka, Tomonari; Sun, Hong–Bo; Kawata, Satoshi

doi:10.1063/1.1432450

Cited by 208 publications

(134 citation statements)

References 14 publications

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“…Two-photon photopolymerization appears to overcome such limitations, and three-dimensional nanostructures (3D) can be fabricated. [286][287][288][289][290] Two recent examples illustrate application of conceptually different approaches in optical lithography based on two-photon absorption. It was demonstrated that initiating species can be generated by single-photon absorption at one wavelength while inhibiting species are generated by single-photon absorption at a second, independent wavelength.…”

Section: New and Emerging Applicationsmentioning

confidence: 99%

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

2010

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The use of photoinitiated polymerization is continuously growing in industry as reflected by the large number of applications in not only conventional areas such as coatings, inks, and adhesives but also high-tech domains, optoelectronics, laser imaging, stereolithography, and nanotechnology. In this Perspective, the latest developments in photoinitiating systems for free radical and cationic polymerizations are presented. The potential use of photochemical methods for step-growth polymerization is also highlighted. The goal is, furthermore, to show approaches to overcome problems associated with the efficiency, wavelength flexibility, and environmental and safety issues in all photoinitiating systems for different modes of activation. Much progress has been made in the past 10 years in the preparation of complex and nanostructured macromolecules by using photoinitiated polymerizations. Thus, the new and emerging applications of photoinitiated polymerizations in the field of biomaterials, surface modification, preparation of block and graft copolymers, and nanocomposites have been addressed.

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Section: New and Emerging Applicationsmentioning

confidence: 99%

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

2010

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“…MPP was first developed by Strickler and Webb, [62] and has now been used to create a range of high-resolution 3D free-form structures, including microchannels, [63][64][65] cantilevers, [66][67][68] microgears, [69,70] sub-micrometer oscillators, [71] hydrophobic atomic force microscopy tips, [72] and PhCs. [59,67,[73][74][75][76][77][78][79][80][81] Briefly, MPP utilizes the nonlinear nature of the multiphoton excitation process to only excite dye molecules in a very small volume around the focal point, with dimensions on the order of the resolution limit.…”

Section: Direct Writingmentioning

confidence: 99%

Introducing Defects in 3D Photonic Crystals: State of the Art

2006

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Public Reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comment regarding this burden estimates or any other aspect of this collection of information, including suggestions for reducing this burden, to Washington Headquarters Services, Directorate for information Operations and Reports, 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302, and to the Office of Management and Budget, Paperwork Reduction Project (0704-0188,) Washington, DC 20503. AGENCY USE ONLY ( Leave Blank)2. REPORT DATE Advanced Materials, 18, 2665-2678 (2006). 3D photonic crystals (PhCs) and photonic bandgap (PBG) materials have attracted considerable scientific and technological interest. In order to provide functionality to PhCs, the introduction of controlled defects is necessary; the importance of defects in PhCs is comparable to that of dopants in semiconductors. Over the past few years, significant advances have been achieved through a diverse set of fabrication techniques. While for some routes to 3D PhCs, such as conventional lithography, the incorporation of defects is relatively straightforward; other methods, for example, selfassembly of colloidal crystals (CCs) or holography, require new external methods for defect incorporation. In this review, we will cover the state of the art in the design and fabrication of defects within 3D PhCs. The figure displays a fluorescence laser scanning confocal microscopy image of a y-splitter defect formed through two-photon polymerization within a CC. SUBJECT TERMS 15. NUMBER OF PAGES 1416. PRICE CODE SECURITY CLASSIFICATION OR REPORT UNCLASSIFIED SECURITY CLASSIFICATION ON THIS PAGE UNCLASSIFIED SECURITY CLASSIFICATION OF ABSTRACT UNCLASSIFIED LIMITATION OF ABSTRACT UL IntroductionPhotonic crystals (PhCs) are materials that possess spatial periodicity in their dielectric constant on the order of the wavelength (k) of light. These materials can strongly modulate light [1] and, with sufficient dielectric contrast and an appropriate geometry, may exhibit a photonic bandgap (PBG). This concept was first proposed in 1975 by Bykov [2] but remained relatively unknown until the seminal work of Yablonovitch [3] and John. [4] In a rough analogy to semiconductors, which possess an electronic bandgap, a PBG material prohibits the existence of photons with energies in the PBG. PhCs are naturally classified by the dimensionality of their periodicity, and in order to rigorously prevent the propagation of PBG frequencies in all directions, a 3D PhC with an omnidirectional, or complete PBG (cPBG) is required. cPBG materials have been fabricated and well characterized for operation at microwave and radio frequencies, however, operation in the visible and IR requires the characteristic length scales of these structures to be scaled down by several orders of magnitude...

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“…Haske et al reported up to 65 nm thin lines, 6 Juodkazis et al reached 30 nm structures in SU-8 photoresist, 7 and Tan et al even sub-25 nm lines in SCR500. 8 Due to the two-photon absorption and the threshold behavior 9 of the used material, it is possible to reach higher resolution than with the often used laser direct writing process. 10,11 Also the precise control of the processing parameters such as the number of pulses, pulse duration, or pulse energy, for example, allow increasing the resolution.…”

Section: Introductionmentioning

confidence: 99%

Development of functional sub-100 nm structures with 3D two-photon polymerization technique and optical methods for characterization

Paz¹,

Emons²,

Obata³

et al. 2012

Journal of Laser Applications

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Investigations of two-photon polymerization (TPP) with sub-100 nm in the structuring resolution are presented by using photosensitive sol-gel material. The high photosensitivity of this material allows for TPP using a large variety in laser pulse durations covering a range between sub-10 fs and ≈140 fs. In this study, the authors demonstrate TPP structuring to obtain sub-100 nm in resolution by different approaches, namely, by adding a cross-linker to the material and polymerization with sub-10 fs short pulses. Additionally, a simulation and model based characterization method for periodic sub-100 nm structures was implemented and applied in an experimental white light interference Fourier-Scatterometry setup.

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Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system

Cited by 208 publications

References 14 publications

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

Introducing Defects in 3D Photonic Crystals: State of the Art

Development of functional sub-100 nm structures with 3D two-photon polymerization technique and optical methods for characterization

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