2013
DOI: 10.1021/nn403295k
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Rapid Prototyping of Fresnel Zone Plates via Direct Ga+ Ion Beam Lithography for High-Resolution X-ray Imaging

Abstract: A significant challenge to the wide utilization of X-ray microscopy lies in the difficulty in fabricating adequate high-resolution optics. To date, electron beam lithography has been the dominant technique for the fabrication of diffractive focusing optics called Fresnel zone plates (FZP), even though this preparation method is usually very complicated and is composed of many fabrication steps. In this work, we demonstrate an alternative method that allows the direct, simple, and fast fabrication of FZPs using… Show more

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Cited by 50 publications
(44 citation statements)
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“…[ 25 ] This less-known method recently proved to allow for the fast prototyping of extended binary objects at high resolution [ 26 ] and offers unique lithographic capabilities. In this contribution, IBL's probably the most striking property in contrast to optical or e-beam lithography was employed as fabrication scheme, namely its ability to directly sculpt elaborate 3D structures in a single step via gray scale lithography, [ 27 ] while other means of gray scale lithography [ 28 ] tend to be more complex.…”
Section: Full Paper Full Paper Full Papermentioning
confidence: 99%
“…[ 25 ] This less-known method recently proved to allow for the fast prototyping of extended binary objects at high resolution [ 26 ] and offers unique lithographic capabilities. In this contribution, IBL's probably the most striking property in contrast to optical or e-beam lithography was employed as fabrication scheme, namely its ability to directly sculpt elaborate 3D structures in a single step via gray scale lithography, [ 27 ] while other means of gray scale lithography [ 28 ] tend to be more complex.…”
Section: Full Paper Full Paper Full Papermentioning
confidence: 99%
“…The method for diffraction efficiency estimation has been discussed elsewhere 58. The measured diffraction efficiencies were found to be lower than ideal.…”
Section: Resultsmentioning
confidence: 99%
“…For the diffraction efficiency measurements a pinhole of diameter, d  = 4 µm was scanned over an area of 85 × 60 µm to image the ML‐FZP mounted on the lift‐out grid as in Figure  3b for each energy. The diffraction efficiency was calculated by dividing average intensity of the 1st order focus to the total intensity on the FZP zones 58. For imaging an OSA of 15 µm width was placed between the ML‐FZP and the sample.…”
Section: Methodsmentioning
confidence: 99%
“…108 Their use spans from milling ribbons in graphene 24 up to fabrication of large-scale Fresnel zone plates. 109 The recent incorporation of excimer lasers into FIB-SEM systems offers the possibility of material removal and patterning on yet larger length scales. 110 The FIB can also perform single pass 3D subtractive lithography.…”
Section: Direct-write Lithographymentioning
confidence: 99%