“…Later, other methods of LPFG inscription, based on refractive index changes in the fibre core induced by thermal heating, were developed, however, in practice, the photochemical approach is most frequently employed for LPFG fabrication. Along with a standard singlequantum technique (248 or 244 nm irradiation), two other methods were proposed: vacuum UV (157 nm) irradiation [6,7], and femtosecond high-intensity 800 nm (or 400 nm) irradiation [8,9,10]. These newly developed photochemical methods include the excitation of high-energy electronic levels in Ge-doped fused silica due to vacuum UV single-quantum and IR (visible) multiple-photon techniques, respectively (see Fig.…”