“…The most common techniques used for the generation of flow patterns on glass substrates are reactive ion etching [ 76 , 77 , 78 , 79 , 80 , 81 ] and wet (chemical) etching [ 80 , 81 , 82 , 83 , 84 ]. Other techniques, such as direct laser writing [ 79 , 85 , 86 , 87 , 88 , 89 ], selective laser-induced etching (SLE) [ 90 , 91 , 92 , 93 ], and direct laser writing and laser micro-welding [ 94 , 95 ], are less common, however they are very attractive for the rapid prototyping of microfluidic devices. Moreover, the SLE process enables the generation of complex three-dimensional structures inside glass, as highlighted in Table 1 , and this eliminates additional fabrication steps related to the bonding of two glass plates together.…”