Rapid fabrication of high aspect ratio silicon nanopillars for chemical analysis

Sainiemi, Lauri; Keskinen, Helmi; Aromaa, Mikko; Luosujärvi, Laura; Grigoras, K.; Kotiaho, Tapio; Mäkelä, Jyrki M.; Franssila, Sami

doi:10.1088/0957-4484/18/50/505303

Cited by 64 publications

(62 citation statements)

References 32 publications

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“…Specific applications include high surface area chemical sensors, 2 mechanical oscillators, 3,4 and piezoresistive sensors. High aspect ratio pillars with diameters between 50-100 nm could prove useful for core-shell type plasmonic resonators, 5 while pillars with sub-10 nm diameters have shown promising light emission characteristics.…”

Section: Introductionmentioning

confidence: 99%

Controllable deformation of silicon nanowires with strain up to 24%

Walavalkar

Homyk

Henry

et al. 2010

Journal of Applied Physics

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Fabricated silicon nanostructures demonstrate mechanical properties unlike their macroscopic counterparts. Here we use a force mediating polymer to controllably and reversibly deform silicon nanowires. This technique is demonstrated on multiple nanowire configurations, which undergo deformation without noticeable macroscopic damage after the polymer is removed. Calculations estimate a maximum of nearly 24% strain induced in 30 nm diameter pillars. The use of an electron activated polymer allows retention of the strained configuration without any external input. As a further illustration of this technique, we demonstrate nanoscale tweezing by capturing 300 nm alumina beads using circular arrays of these silicon nanowires.

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Section: Introductionmentioning

confidence: 99%

Controllable deformation of silicon nanowires with strain up to 24%

Walavalkar

Homyk

Henry

et al. 2010

Journal of Applied Physics

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“…Angiotensin I, angiotensin II, bombesin, Substance P, and des-arg 9 -bradykinin were from PeptaNova (Sandhausen, Germany), cytochrome c and ␤-lactoglobulin were from Sigma-Aldrich Chemie GmbH (Munich, Germany) and verapamil hydrochloride (98% purity) was from Aldrich Chem. Co (Milwaukee, WI, USA).…”

Section: Methodsmentioning

confidence: 99%

“…Spot to spot variation was reduced by always measuring from multiple sample spots on the same sample plates, and averaging the results. The substrate material test, substrate topography test, coating material test, and the des-arg 9 -bradykinin sensitivity test were also repeated on at least two different batches of chips to control for random variations in the fabrication process and to verify the results.…”

Section: Evaluation Of Sample Platesmentioning

confidence: 99%

“…The detection limits of SALDI techniques for small peptides are often comparable to MALDI (high attomoles), and in some cases can even greatly surpass them [4]. The feasibility of SALDI-MS has been demonstrated in the analysis of many different types of analytes, including peptides [1], trypsin digests [5,6], proteins up to 24 kDa in mass [7,8], small drug molecules [4,9], and polymers [6].…”

mentioning

confidence: 99%

“…Silicon has remained the most common material and, in addition to porous silicon, SALDI has been reported on silicon nanowires [12], nanopillars [9], nanocavity arrays [13], nanogroove arrays [14], column/void silicon thin films [15], and amorphous silicon (␣-Si) [16]. However, silicon as a material is not a necessary requirement SALDI, which has also been reported on etched carbon [17], germanium nanodots [6], titania nanotube arrays [18], and nanocrystalline titania [7], carbon nanotube arrays [19], metal coated porous alumina [8], and cobalt and graphite particle suspensions [10,11].…”

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confidence: 99%

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Surface assisted laser desorption/ionization on two-layered amorphous silicon coated hybrid nanostructures

Jokinen

Aura²,

Luosujärvi

et al. 2009

J. Am. Soc. Mass Spectrom.

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Matrix-free laser desorption/ionization was studied on two-layered sample plates consisting of a substrate and a thin film coating. The effect of the substrate material was studied by depositing thin films of amorphous silicon on top of silicon, silica, polymeric photoresist SU-8, and an inorganic-organic hybrid. Des-arg 9 -bradykinin signal intensity was used to evaluate the sample plates. Silica and hybrid substrates were found to give superior signals compared with silicon and SU-8 because of thermal insulation and compatibility with amorphous silicon deposition process. The effect of surface topography was studied by growing amorphous silicon on hybrid micro-and nanostructures, as well as planar hybrid. Compared with planar sample plates, micro-and nanostructures gave weaker and stronger signals, respectively. Different coating materials were tested by growing different thin film coatings on the same substrate. Good signals were obtained from titania and amorphous silicon coated sample plates, but not from alumina coated, silicon nitride coated, or uncoated sample plates. Overall, the strongest signals were obtained from oxygen plasma treated and amorphous silicon coated inorganic-organic hybrid, which was tested for peptide-, protein-, and drug molecule analysis. Peptides and drugs were analyzed with little interference at low masses, subfemtomole detection levels were achieved for des-arg 9 -bradykinin, and the sample plates were also suitable for ionization of small proteins. (J Am Soc Mass

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Deep Reactive Ion Etching

Franssila

2010

Introduction to Microfabrication

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Reactive ion etching (RIE) (which we will use as a synonym for plasma etching) opens up many possibilities which cannot be done by wet etching. Practically any size and shape can be made by RIE. All sorts of mechanical devices, like springs, beams and plates, are fabricated by plasma etching, as are vertical capacitors and mirrors, in-plane and out-of-plane microneedles and nozzles, and fluidic filters and separation devices.DRIE is an extension of RIE for deep etching, but depth is very different from application to application. For example, in SOI MEMS there is a need to etch the SOI device layer, which can be 5-50 μm, but in many cases also the handle wafer needs to be etched, that is 300-500 μm. While typical RIE rates are on the order of 0.1-1 μm/min, DRIE rates are 2-20 μm/min. Even higher rates have been reported, but then other criteria have been sacrificed: sidewall profile control is poor and high rates are only available for designs which have small etchable area.This chapter concentrates on silicon DRIE processes, with some basic structures discussed. Comparison is often made to anisotropic wet etching because sometimes DRIE and KOH can both be used, and selection has to be reasoned. More advanced device examples will be found in Chapter 30 on MEMS integration. Introduction to Microfabrication, Second E ditionSami Franssila

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Rapid fabrication of high aspect ratio silicon nanopillars for chemical analysis

Cited by 64 publications

References 32 publications

Controllable deformation of silicon nanowires with strain up to 24%

Controllable deformation of silicon nanowires with strain up to 24%

Surface assisted laser desorption/ionization on two-layered amorphous silicon coated hybrid nanostructures

Deep Reactive Ion Etching

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