2020
DOI: 10.1016/j.optlaseng.2020.106200
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Rapid characterization of nano-scale structures in large-scale ultra-precision surfaces

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Cited by 7 publications
(1 citation statement)
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“…A variety of metrology tools have been applied to characterizing thin-film structures including 2D materials, such as atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectroscopy, and ellipsometry . Although AFM and SEM can provide high spatial resolution and measurement precision, they pose potential damage to a specimen and have an extremely low measurement throughput. , Raman spectroscopy/microscopy can be applied to distinguishing the number of layers of 2D materials , of limited types (e.g., multilayers of graphene sheets can hardly be differentiated), whereas the measurement speed is extremely low, especially when providing spatial mapping based on scanning. Imaging ellipsometry provides a contact-free mapping of 2D material thickness profiles, but the involved scanning of wavelengths or illumination angles and the high complexity in model fitting can potentially hinder the measurement throughput …”
Section: Introductionmentioning
confidence: 99%
“…A variety of metrology tools have been applied to characterizing thin-film structures including 2D materials, such as atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectroscopy, and ellipsometry . Although AFM and SEM can provide high spatial resolution and measurement precision, they pose potential damage to a specimen and have an extremely low measurement throughput. , Raman spectroscopy/microscopy can be applied to distinguishing the number of layers of 2D materials , of limited types (e.g., multilayers of graphene sheets can hardly be differentiated), whereas the measurement speed is extremely low, especially when providing spatial mapping based on scanning. Imaging ellipsometry provides a contact-free mapping of 2D material thickness profiles, but the involved scanning of wavelengths or illumination angles and the high complexity in model fitting can potentially hinder the measurement throughput …”
Section: Introductionmentioning
confidence: 99%